SCHEMBL28142199

SCHEMBL28142199

CCCCCC(C)CCNO

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ACE2 Q9BYF1 1/20 0.48
OPRM1 P35372 1/20 0.41
CA1 P00915 3/20 0.39
SPHK1 Q9NYA1 1/20 0.39
LMNA P02545 2/20 0.39
PRKD3 O94806 1/20 0.39
PRKCG P05129 1/20 0.39
PRKCB P05771 1/20 0.39
PRKCA P17252 1/20 0.39
PRKCH P24723 1/20 0.39
PRKCI P41743 1/20 0.39
PRKCE Q02156 1/20 0.39
PRKCQ Q04759 1/20 0.39
PRKCZ Q05513 1/20 0.39
PRKCD Q05655 1/20 0.39
PRKD1 Q15139 1/20 0.39
TP53 P04637 1/20 0.38
ADH1B P00325 1/20 0.36
ADH1C P00326 1/20 0.36
ADH1A P07327 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19577869 0.84 ACE2 (0.41) ACE2OPRM1CA1LMNAPRKD3
SCHEMBL24740599 0.83
SCHEMBL4904464 0.80 ACE2 (0.58) ACE2OPRM1CA1SPHK1LMNA
SCHEMBL16898151 0.79 ACE2 (0.45) ACE2OPRM1CA1SPHK1LMNA
SCHEMBL8222217 0.79 EPHX1 (0.50) ACE2OPRM1CA1SPHK1LMNA
SCHEMBL21337579 0.79 EPHX1 (0.50) ACE2OPRM1CA1SPHK1LMNA
SCHEMBL27647913 0.79 ACE2 (0.45) ACE2OPRM1CA1SPHK1LMNA
SCHEMBL21478008 0.79 EPHX1 (0.50) ACE2OPRM1CA1SPHK1LMNA
SCHEMBL10304243 0.78 ACE2 (0.54) ACE2OPRM1CA1SPHK1LMNA
SCHEMBL9834068 0.78 ACE2 (0.54) ACE2OPRM1CA1SPHK1LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-104470892-B Metal alkoxide compound, thin film-forming starting material, method for producing thin film, and alcohol compound 株式会社艾迪科 2017-05-17 CN disclosed
CN-104470892-A Metal alkoxide compound, thin film-forming starting material, method for producing thin film, and alcohol compound ADEKA CORP 2015-03-25 CN disclosed