SCHEMBL28223404

SCHEMBL28223404

CCC[N+](O)(CC)CC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Water SCHEMBL5388895 0.97 SLC22A1 (0.39)
SCHEMBL5547383 0.85 SLC22A1 (0.47)
Water SCHEMBL29187735 0.78 SLC22A1 (0.45)
SCHEMBL29039789 0.78 SLC22A1 (0.53)
SCHEMBL435553 0.76
SCHEMBL5547268 0.76
SCHEMBL10820918 0.76
Water SCHEMBL29187736 0.76 SLC22A1 (0.50)
SCHEMBL28164337 0.76 SLC22A1 (0.55)
SCHEMBL28140081 0.76 SLC22A1 (0.55)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-104238270-B Composition, method for forming pattern, crystal grain and method for manufacturing display device 奇美实业股份有限公司 2018-11-09 CN disclosed
CN-104345557-B Negative photosensitive resin composition, pattern, crystal grain and device manufacturing method 奇美实业股份有限公司 2018-06-22 CN disclosed