SCHEMBL282379

SCHEMBL282379

CC1[CH]C1(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14931233 1.00
SCHEMBL10895793 0.69
SCHEMBL16289054 0.68
SCHEMBL16673609 0.64
SCHEMBL766963 0.60
SCHEMBL910062 0.59
SCHEMBL18828483 0.56
SCHEMBL910798 0.56
SCHEMBL104998 0.56
SCHEMBL9246880 0.50

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 892 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10295907-B2 Resist underlayer film-forming composition for lithography containing polymer having acrylamide structure and acrylic acid ester structure NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2019-05-21 US claimed
US-12044968-B2 Protective film-forming composition having acetal structure and amide structure NISSAN CHEMICAL CORPORATION (JP) 2024-07-23 US disclosed
EP-4401115-A1 METHOD FOR CLEANING SEMICONDUCTOR SUBSTRATE, METHOD FOR MANUFACTURING PROCESSED SEMICONDUCTOR SUBSTRATE, AND COMPOSITION FOR EXFOLIATION AND DISSOLUTION Nissan Chemical Corporation (JP) 2024-07-17 EP disclosed
US-20240231230-A1 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM NISSAN CHEMICAL CORPORATION (JP) 2024-07-11 US disclosed
EP-4397623-A1 EPOXY GROUP-CONTAINING ORGANOSILICA SOL, EPOXY RESIN COMPOSITION AND PRODUCTION METHOD THEREOF Nissan Chemical Corporation (JP) 2024-07-10 EP disclosed
EP-4398285-A1 ADHESIVE COMPOSITION, MULTILAYER BODY, AND METHOD FOR PRODUCING PROCESSED SEMICONDUCTOR SUBSTRATE Nissan Chemical Corporation (JP) 2024-07-10 EP disclosed
US-12030974-B2 Composition for forming block copolymer layer for formation of microphase-separated pattern NISSAN CHEMICAL CORPORATION (JP) 2024-07-09 US disclosed
US-20240222180-A1 LAMINATE, METHOD FOR MANUFACTURING LAMINATE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE NISSAN CHEMICAL CORPORATION (JP) 2024-07-04 US disclosed
US-20240218293-A1 CLEANING AGENT COMPOSITION AND CLEANING METHOD NISSAN CHEMICAL CORPORATION (JP) 2024-07-04 US disclosed
EP-4393877-A1 DISPERSION OF SURFACE-TREATED SILICA-CONTAINING INORGANIC OXIDE PARTICLES AND METHOD FOR PRODUCING SAME Nissan Chemical Corporation (JP) 2024-07-03 EP disclosed
US-5290934-A Benzoheterocyclic compounds OTSUKA PHARMACEUTICAL COMPANY, LIMITED (JP) 1994-03-01 US disclosed
EP-0565132-A2 Benzoheterocyclic compounds OTSUKA PHARMACEUTICAL CO., LTD. (JP) 1993-10-13 EP disclosed
US-4820821-A ANTIDEPRESSANTS, ANTIHYPOTONIC AGENTS, ANTIPARKINSON DRUGS BASF AKTIENGESELLSCHAFT (DE) 1989-04-11 US disclosed
CN-1030237-A BENZOHETEROCYCLIC COMPOUNDS OTSUKA PHARMA CO LTD (JP) 1989-01-11 CN disclosed
EP-0287951-A2 7-Piperazinyl- or 7-Morpholino-4-oxo-quinoline-3-carboxylic acid derivatives, their preparation and their use as antimicrobial agents OTSUKA PHARMACEUTICAL CO., LTD. (JP) 1988-10-26 EP disclosed
EP-0078989-B1 PYRIDAZINONE IMINES AND THEIR PHYSIOLOGICALLY TOLERABLE ADDITION SALTS, PROCESS FOR THEIR PREPARATION AND THERAPEUTICAL AGENTS CONTAINING THOSE COMPOUNDS BASF Aktiengesellschaft (DE) 1985-05-08 EP disclosed
EP-0042107-B1 DIHYDROPYRIDAZINONES, PROCESSES FOR THEIR PREPARATION AND PHARMACEUTICAL COMPOSITIONS CONTAINING THESE COMPOUNDS BASF Aktiengesellschaft (DE) 1985-04-03 EP disclosed
US-4410529-A HYPOTENSIVE AGNENTS, ANTICOAGULANTS BASF AKTIENGESELLSCHAFT (DE) 1983-10-18 US disclosed
EP-0078989-A1 Pyridazinone imines and their physiologically tolerable addition salts, process for their preparation and therapeutical agents containing those compounds BASF Aktiengesellschaft (DE) 1983-05-18 EP disclosed
EP-0042107-A1 Dihydropyridazinones, processes for their preparation and pharmaceutical compositions containing these compounds BASF Aktiengesellschaft (DE) 1981-12-23 EP disclosed