Ethane

Ethane

SCHEMBL28293192

CC.CC[Si](C)(C)C

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL152107 0.94
SCHEMBL29947198 0.89
Ammonia Solution, Strong SCHEMBL14808976 0.89
Ethane SCHEMBL5423309 0.78 ALPG (0.30)
SCHEMBL15436149 0.77
SCHEMBL17558940 0.71
SCHEMBL28396651 0.71
SCHEMBL9114146 0.67
SCHEMBL411434 0.67
SCHEMBL379483 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109791871-A Remote plasma based deposition of graded or multilayered silicon carbide films 朗姆研究公司 2019-05-21 CN disclosed