Triethylene Glycol

Triethylene Glycol

SCHEMBL28296600

NC(=O)O.OCCOCCOCCO

nearest known ligand 0.65

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 4/20 0.65
MEN1 O00255 3/20 0.65
TSHR P16473 5/20 0.59
MAPK1 P28482 1/20 0.59
THRB P10828 1/20 0.42
HTT P42858 1/20 0.42
MAPT P10636 1/20 0.42
ACHE P22303 1/20 0.41
ALDH1A1 P00352 4/20 0.41
HSD17B10 Q99714 2/20 0.37
BLM P54132 1/20 0.37
PMP22 Q01453 1/20 0.37
GAA P10253 1/20 0.34
APP P05067 1/20 0.34
TP53 P04637 2/20 0.33
HIF1A Q16665 2/20 0.33
NOS3 P29474 1/20 0.31
NOS1 P29475 1/20 0.31
NOS2 P35228 1/20 0.31
SMN1; SMN2 Q16637 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Tetraethylene Glycol SCHEMBL1013721 1.00 KMT2A (0.65) KMT2AMEN1TSHRMAPK1THRB
Di(Hydroxyethyl)Ether SCHEMBL28461941 0.97 TSHR (0.62) KMT2AMEN1TSHRMAPK1THRB
Di(Hydroxyethyl)Ether SCHEMBL11326327 0.97 TSHR (0.62) KMT2AMEN1TSHRMAPK1THRB
Triethylene Glycol SCHEMBL6398483 0.91 MEN1 (0.69) KMT2AMEN1TSHRMAPK1THRB
Hexaethylene Glycol SCHEMBL9467416 0.88 KMT2A (0.73) KMT2AMEN1TSHRMAPK1THRB
Tetraethylene Glycol SCHEMBL9467861 0.88 KMT2A (0.73) KMT2AMEN1TSHRMAPK1THRB
Triethylene Glycol SCHEMBL11091011 0.88 KMT2A (0.73) KMT2AMEN1TSHRMAPK1THRB
Pentaethylene Glycol SCHEMBL9467222 0.88 KMT2A (0.73) KMT2AMEN1TSHRMAPK1THRB
Bicarbonate SCHEMBL28537044 0.88 KMT2A (0.73) KMT2AMEN1TSHRMAPK1THRB
Triethylene Glycol SCHEMBL9468047 0.88 KMT2A (0.73) KMT2AMEN1TSHRMAPK1THRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-105199480-B A kind of photocuring solder mask ink composition 永胜泰油墨(深圳)有限公司 2019-05-17 CN disclosed