Known targets — ChEMBL curated mechanism
The experimentally established mechanism targets of Sulfuric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 1/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.42 |
| ▸ | TSHR | P16473 | 1/20 | 0.42 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.42 |
| ▸ | TP53 | P04637 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Sulfuric Acid SCHEMBL2834855 | 1.00 | MEN1 (0.42) | MEN1ALDH1A1TSHRKMT2ATP53 | |
| Sulfuric Acid SCHEMBL5603827 | 0.94 | MEN1 (0.46) | MEN1ALDH1A1TSHRKMT2ATP53 | |
| Sulfuric Acid SCHEMBL9092346 | 0.88 | MEN1 (0.42) | MEN1ALDH1A1TSHRKMT2ATP53 | |
| Sulfuric Acid SCHEMBL9683400 | 0.88 | — | — | |
| Sulfuric Acid SCHEMBL9453215 | 0.88 | — | — | |
| Sulfuric Acid SCHEMBL8505519 | 0.88 | — | — | |
| Sulfuric Acid SCHEMBL7705015 | 0.88 | MEN1 (0.42) | MEN1ALDH1A1TSHRKMT2ATP53 | |
| Sulfuric Acid SCHEMBL3116870 | 0.88 | MEN1 (0.42) | MEN1ALDH1A1TSHRKMT2ATP53 | |
| Sulfuric Acid SCHEMBL6416408 | 0.88 | MEN1 (0.42) | MEN1ALDH1A1TSHRKMT2ATP53 | |
| Sulfuric Acid SCHEMBL619135 | 0.88 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2008023339-A2 | METHOD AND COMPOSITION FOR THE DEPOSITION OF PALLADIUM LAYERS AND PALLADIUM ALLOY LAYERS | ENTHONE INC. (US) | 2008-02-28 | — | — | WO | claimed |
| US-6811674-B2 | A PALLADIUM PLATING SOLUTION CONSISTS OF A SOLUBLE PALLADIUM SALT, A SULFAMIC ACID OR ITS SALT, FREE FROM BRIGHTENING AGENT; PALLADIUM PLATING SOLUTION WHICH CAN FORM A PLATED SURFACE HAVING GOOD ADHESION TO RESIN | MATSUDA SANGYO CO., LTD. (JP) | 2004-11-02 | — | — | US | claimed |
| WO-2010075056-A2 | AIRCRAFT AIR TREATMENT CATALYSTS, SYSTEMS AND METHODS | BASF CATALYSTS LLC (US) | 2010-07-01 | — | — | WO | disclosed |
| US-20100152032-A1 | Aircraft Air Treatment Catalysts, Systems and Methods | BASF CATALYSTS LLC (US) | 2010-06-17 | — | — | US | disclosed |
| WO-2008023339-A2 | METHOD AND COMPOSITION FOR THE DEPOSITION OF PALLADIUM LAYERS AND PALLADIUM ALLOY LAYERS | ENTHONE INC. (US) | 2008-02-28 | — | — | WO | disclosed |
| EP-1892320-A1 | Electrolyte composition and method for the electrolytic deposition of layers containing palladium | ENTHONE, INCORPORATED (US) | 2008-02-27 | — | — | EP | disclosed |
| US-6811674-B2 | A PALLADIUM PLATING SOLUTION CONSISTS OF A SOLUBLE PALLADIUM SALT, A SULFAMIC ACID OR ITS SALT, FREE FROM BRIGHTENING AGENT; PALLADIUM PLATING SOLUTION WHICH CAN FORM A PLATED SURFACE HAVING GOOD ADHESION TO RESIN | MATSUDA SANGYO CO., LTD. (JP) | 2004-11-02 | — | — | US | disclosed |
| US-20020144909-A1 | A palladium plating solution consists of a soluble palladium salt, a sulfamic acid or its salt, free from brightening agent; palladium plating solution which can form a plated surface having good adhesion to resin | MATSUDA SANGYO CO., LTD. | 2002-10-10 | — | — | US | disclosed |