SCHEMBL283273

SCHEMBL283273

CC1[CH]C(C)C1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1920521 0.79
SCHEMBL4940627 0.73
SCHEMBL910947 0.71
SCHEMBL1085992 0.71
SCHEMBL3067780 0.70
SCHEMBL8169190 0.69
SCHEMBL21647296 0.69
SCHEMBL294150 0.67
SCHEMBL5573230 0.67
SCHEMBL10991619 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1156 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113423745-B Method for producing polymer having compatibility with biological material 日产化学株式会社 2024-01-09 CN claimed
US-10295907-B2 Resist underlayer film-forming composition for lithography containing polymer having acrylamide structure and acrylic acid ester structure NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2019-05-21 US claimed
US-5756813-A TREATING RETROVIRUSES SUCH AS HUMAN IMMUNODEFICIENCY VIRUS UNIROYAL CHEMICAL LTD/UNIROYAL CHEMICAL LTEE (CA) 1998-05-26 US claimed
US-5550280-A INHIBITING GROWTH OR REPLICATION OF RETROVIRUSES SUCH AS HIV UNIROYAL CHEMICAL LTD./ UNIROYAL CHEMICAL LTEE (CA) 1996-08-27 US claimed
US-12044968-B2 Protective film-forming composition having acetal structure and amide structure NISSAN CHEMICAL CORPORATION (JP) 2024-07-23 US disclosed
EP-4401115-A1 METHOD FOR CLEANING SEMICONDUCTOR SUBSTRATE, METHOD FOR MANUFACTURING PROCESSED SEMICONDUCTOR SUBSTRATE, AND COMPOSITION FOR EXFOLIATION AND DISSOLUTION Nissan Chemical Corporation (JP) 2024-07-17 EP disclosed
CN-118355328-A Composition for forming resist underlayer film comprising polymer containing polycyclic aromatic group 日产化学株式会社 2024-07-16 CN disclosed
CN-118339515-A Composition for forming resist underlayer film having hydroxycinnamic acid derivative 日产化学株式会社 2024-07-12 CN disclosed
CN-118339251-A Release agent, adhesive composition, laminate, and method for producing semiconductor substrate 日产化学株式会社 2024-07-12 CN disclosed
US-20240231230-A1 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM NISSAN CHEMICAL CORPORATION (JP) 2024-07-11 US disclosed
EP-4397623-A1 EPOXY GROUP-CONTAINING ORGANOSILICA SOL, EPOXY RESIN COMPOSITION AND PRODUCTION METHOD THEREOF Nissan Chemical Corporation (JP) 2024-07-10 EP disclosed
EP-4398285-A1 ADHESIVE COMPOSITION, MULTILAYER BODY, AND METHOD FOR PRODUCING PROCESSED SEMICONDUCTOR SUBSTRATE Nissan Chemical Corporation (JP) 2024-07-10 EP disclosed
US-5086071-A Improved chemical stability and ppotent in vivo TORAY INDUSTRIES, INC. (JP) 1992-02-04 US disclosed
EP-0232776-B1 2,5,6,7-TETRANOR-4,8-INTER-M-PHENYLENE PGI2 DERIVATIVES TORAY INDUSTRIES, INC. (JP) 1990-10-24 EP disclosed
EP-0389162-A1 2,5,6,7-Tetranor-4,8-inter-m-phenylene PGI2 derivatives TORAY INDUSTRIES, INC. (JP) 1990-09-26 EP disclosed
EP-0365678-A1 2,5,6,7-TETRANOR-4,8-INTER-m-PHENYLENE PGI 2 DERIVATIVES, PROCESS FOR THEIR PREPARATION, AND USE THEREOF TORAY INDUSTRIES, INC. (JP) 1990-05-02 EP disclosed
US-4880939-A ANTISECRETORY AGENTS, HYPOTENSIVES, ANTICOAGULANTS TORAY INDUSTRIES (JP) 1989-11-14 US disclosed
US-4775692-A ANTILIPEMIC, ANTICOAGULANT, HYPOTENSIVE, ANTISECRETORY AND ANTIULCER AGENT TORAY INDUSTRIES, INC. (JP) 1988-10-04 US disclosed
EP-0274064-A2 2,5,6,7-Tetranor-18,18,19,19-tetradehydro-4,8-inter-m-phenylene PGI2 derivatives TORAY INDUSTRIES, INC. (JP) 1988-07-13 EP disclosed
EP-0232776-A2 2,5,6,7-tetranor-4,8-inter-m-phenylene PGI2 derivatives TORAY INDUSTRIES, INC. (JP) 1987-08-19 EP disclosed