SCHEMBL2833742

SCHEMBL2833742

COC(=O)C1(C2CCC2)CCC1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP3A4 P08684 3/20 0.44
LMNA P02545 2/20 0.44
CHRM2 P08172 2/20 0.44
CHRM4 P08173 2/20 0.44
CHRM3 P20309 2/20 0.44
ABCB11 O95342 1/20 0.44
CYP1A2 P05177 1/20 0.44
CHRM5 P08912 1/20 0.44
CYP2D6 P10635 1/20 0.44
CHRM1 P11229 1/20 0.44
CYP2C9 P11712 1/20 0.44
TSHR P16473 1/20 0.44
DRD1 P21728 1/20 0.44
HRH2 P25021 1/20 0.44
HTR2A P28223 1/20 0.44
HTR2C P28335 1/20 0.44
HRH1 P35367 1/20 0.44
DRD3 P35462 1/20 0.44
SCN1A P35498 1/20 0.44
THPO P40225 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20054732 0.94 CYP3A4 (0.50) CYP3A4LMNACHRM2CHRM4CHRM3
SCHEMBL1709532 0.94 CYP3A4 (0.45) CYP3A4LMNACHRM2CHRM4CHRM3
SCHEMBL11858353 0.90 CYP3A4 (0.54) CYP3A4LMNACHRM2CHRM4CHRM3
SCHEMBL20103712 0.90 CYP3A4 (0.50) CYP3A4LMNACHRM2CHRM4CHRM3
SCHEMBL10256656 0.88 CYP3A4 (0.47) CYP3A4LMNACHRM2CHRM4CHRM3
SCHEMBL20054680 0.85 CYP3A4 (0.37) CYP3A4LMNACHRM2CHRM4CHRM3
SCHEMBL20054577 0.85 CYP3A4 (0.40) CYP3A4LMNACHRM2CHRM4CHRM3
SCHEMBL3669479 0.85 NPSR1 (0.39) CYP3A4LMNACHRM2CHRM4CHRM3
SCHEMBL6267359 0.82 NPSR1 (0.38) CYP3A4LMNACHRM2CHRM4CHRM3
Isothiocyanate SCHEMBL27823426 0.81 CYP3A4 (0.47) CYP3A4LMNACHRM2CHRM4CHRM3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024263704-A2 NOVOLAK RESIN COMPOSITION AND METHOD OF MAKING THE SAME SI GROUP, INC. (US) 2024-12-26 WO disclosed
US-9512250-B2 Manganese catalyzed photopolymerization of fluorinated monomers UNIVERSITY OF CONNECTICUT (US) 2016-12-06 US disclosed
US-9193810-B2 Free radical and controlled radical polymerization processes using hypervalent iodide radical initiators UNIVERSITY OF CONNECTICUT (US) 2015-11-24 US disclosed
US-20150057419-A1 FREE RADICAL AND CONTROLLED RADICAL POLYMERIZATION PROCESSES USING AZIDE RADICAL INITIATORS UNIVERSITY OF CONNECTICUT 2015-02-26 US disclosed
EP-1858975-B1 MODIFIED NOVOLAK RESIN FOR USE AS TACKIFIER SCHENECTADY INT INC (US) 2014-06-04 EP disclosed
US-20130225775-A1 FREE RADICAL AND CONTROLLED RADICAL POLYMERIZATION PROCESSES USING HYPERVALENT IODIDE RADICAL INITIATORS UNIVERSITY OF CONNECTICUT (US) 2013-08-29 US disclosed
US-20130225712-A1 MANGANESE CATALYZED PHOTOPOLYMERIZATION OF FLUORINATED MONOMERS UNIVERSITY OF CONNECTICUT (US) 2013-08-29 US disclosed
US-7772345-B2 Modified novolak resin for use as tackifier SI GROUP, INC. (US) 2010-08-10 US disclosed
US-20060199924-A1 Modified novolak resin for use as tackifier SCHENECTADY INTERNATIONAL, INC. (US) 2006-09-07 US disclosed
US-6756457-B2 POLYMERIZING VINYL MONOMERS IN PRESENCE OF INITIATING SYSTEM COMPRISING ORGANIC SULFUR COMPOUND AND ONIUM SALT CATALYST EASTMAN KODAK COMPANY 2004-06-29 US disclosed
US-6737486-B2 USING ORGANIC HALIDE OR SULFUR INITIATOR; MAINTAINING PROCESS CONTROL AND UNIFORMITY EASTMAN KODAK COMPANY 2004-05-18 US disclosed
US-20040014919-A1 Novel polymerization process EASTMAN KODAK COMPANY 2004-01-22 US disclosed
US-20040014910-A1 Novel polymerization process EASTMAN KODAK COMPANY 2004-01-22 US disclosed