SCHEMBL2833747

SCHEMBL2833747

COC(=O)C1CCC1.COC(=O)C1CCC1

nearest known ligand 0.59

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 3/20 0.59
TP53 P04637 1/20 0.52
POLB P06746 1/20 0.48
HTT P42858 1/20 0.48
KMT2A Q03164 1/20 0.48
TDP1 Q9NUW8 1/20 0.48
CHRNB2 P17787 2/20 0.46
CHRNA4 P43681 2/20 0.46
CHRNB4 P30926 1/20 0.46
CHRNA3 P32297 1/20 0.46
CHRNA7 P36544 1/20 0.46
ALDH1A1 P00352 1/20 0.44
GAA P10253 1/20 0.44
CHRM2 P08172 1/20 0.44
CHRM4 P08173 1/20 0.44
CHRM3 P20309 1/20 0.44
PPM1B O75688 1/20 0.43
PTPN1 P18031 1/20 0.43
PPP1CC P36873 1/20 0.43
BRD4 O60885 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18408 1.00
SCHEMBL23458811 0.97 SMN1; SMN2 (0.62) SMN1; SMN2TP53POLBHTTKMT2A
Hydrochloric Acid SCHEMBL27905220 0.97
Water SCHEMBL28833621 0.97
SCHEMBL17566 0.94
SCHEMBL18760457 0.92 SMN1; SMN2 (0.68) SMN1; SMN2TP53POLBCHRNB2CHRNA4
SCHEMBL12326212 0.92 SMN1; SMN2 (0.68) SMN1; SMN2TP53POLBCHRNB2CHRNA4
SCHEMBL1818944 0.92 SMN1; SMN2 (0.68) SMN1; SMN2TP53POLBCHRNB2CHRNA4
Ammonia Solution, Strong SCHEMBL6014426 0.92 SMN1; SMN2 (0.62) SMN1; SMN2TP53POLBHTTKMT2A
SCHEMBL7119913 0.92 SMN1; SMN2 (0.68) SMN1; SMN2TP53POLBCHRNB2CHRNA4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9512250-B2 Manganese catalyzed photopolymerization of fluorinated monomers UNIVERSITY OF CONNECTICUT (US) 2016-12-06 US disclosed
US-9193810-B2 Free radical and controlled radical polymerization processes using hypervalent iodide radical initiators UNIVERSITY OF CONNECTICUT (US) 2015-11-24 US disclosed
US-20150057419-A1 FREE RADICAL AND CONTROLLED RADICAL POLYMERIZATION PROCESSES USING AZIDE RADICAL INITIATORS UNIVERSITY OF CONNECTICUT 2015-02-26 US disclosed
EP-1858975-B1 MODIFIED NOVOLAK RESIN FOR USE AS TACKIFIER SCHENECTADY INT INC (US) 2014-06-04 EP disclosed
US-20130225775-A1 FREE RADICAL AND CONTROLLED RADICAL POLYMERIZATION PROCESSES USING HYPERVALENT IODIDE RADICAL INITIATORS UNIVERSITY OF CONNECTICUT (US) 2013-08-29 US disclosed
US-20130225712-A1 MANGANESE CATALYZED PHOTOPOLYMERIZATION OF FLUORINATED MONOMERS UNIVERSITY OF CONNECTICUT (US) 2013-08-29 US disclosed
US-7772345-B2 Modified novolak resin for use as tackifier SI GROUP, INC. (US) 2010-08-10 US disclosed
US-20060199924-A1 Modified novolak resin for use as tackifier SCHENECTADY INTERNATIONAL, INC. (US) 2006-09-07 US disclosed
US-6756457-B2 POLYMERIZING VINYL MONOMERS IN PRESENCE OF INITIATING SYSTEM COMPRISING ORGANIC SULFUR COMPOUND AND ONIUM SALT CATALYST EASTMAN KODAK COMPANY 2004-06-29 US disclosed
US-6737486-B2 USING ORGANIC HALIDE OR SULFUR INITIATOR; MAINTAINING PROCESS CONTROL AND UNIFORMITY EASTMAN KODAK COMPANY 2004-05-18 US disclosed
US-20040014919-A1 Novel polymerization process EASTMAN KODAK COMPANY 2004-01-22 US disclosed
US-20040014910-A1 Novel polymerization process EASTMAN KODAK COMPANY 2004-01-22 US disclosed