SCHEMBL2834703

SCHEMBL2834703

O=C(O)c1cccc2ccc3cccc(C(=O)O)c3c12

nearest known ligand 0.75

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HSD17B10 Q99714 3/20 0.75
NR4A1 P22736 1/20 0.58
NR4A2 P43354 1/20 0.58
NR4A3 Q92570 1/20 0.58
MEN1 O00255 2/20 0.56
KMT2A Q03164 2/20 0.56
ALDH1A1 P00352 5/20 0.55
KDM4E B2RXH2 3/20 0.55
TSHR P16473 3/20 0.55
RXFP1 Q9HBX9 1/20 0.55
CYP1A2 P05177 2/20 0.55
ALOX15 P16050 1/20 0.55
CDC25B P30305 1/20 0.50
KEAP1 Q14145 1/20 0.50
MAPT P10636 1/20 0.48
TDP1 Q9NUW8 1/20 0.48
PTPN1 P18031 1/20 0.48
WDR5 P61964 1/20 0.48
HPGD P15428 2/20 0.48
CYP1A1 P04798 1/20 0.48

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Ammonia Solution, Strong SCHEMBL31590816 0.98 HSD17B10 (0.72) HSD17B10NR4A1NR4A2NR4A3MEN1
Hydrochloric Acid SCHEMBL4607898 0.98 HSD17B10 (0.72) HSD17B10NR4A1NR4A2NR4A3MEN1
Ammonia Solution, Strong SCHEMBL31590375 0.98 HSD17B10 (0.72) HSD17B10NR4A1NR4A2NR4A3MEN1
SCHEMBL68291 0.92 HSD17B10 (0.78) HSD17B10NR4A1NR4A2NR4A3MEN1
Benzene SCHEMBL28110156 0.92 HSD17B10 (0.78) HSD17B10NR4A1NR4A2NR4A3MEN1
SCHEMBL29404347 0.92 HSD17B10 (0.78) HSD17B10NR4A1NR4A2NR4A3MEN1
SCHEMBL7624693 0.92 HSD17B10 (0.78) HSD17B10NR4A1NR4A2NR4A3MEN1
Hydrochloric Acid SCHEMBL10337055 0.90 HSD17B10 (0.75) HSD17B10NR4A1NR4A2NR4A3MEN1
Charcoal, Activated SCHEMBL5746941 0.90 HSD17B10 (0.75) HSD17B10NR4A1NR4A2NR4A3MEN1
SCHEMBL7732114 0.90 HSD17B10 (0.75) HSD17B10NR4A1NR4A2NR4A3MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 52 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4831189-A PEROXIDATION USING TUNGSTEN CATALYST AND PHASE TRANSFER AGENT NIPPON SHOKUBAI KAGAKU KOGYO CO. LTD. (JP) 1989-05-16 US claimed
EP-0193368-B1 PROCESS FOR PRODUCING AROMATIC DICARBOXYLIC ACIDS Nippon Shokubai Kagaku Kogyo Co., Ltd (JP) 1989-01-11 EP claimed
EP-0193368-A1 Process for producing aromatic dicarboxylic acids Nippon Shokubai Kagaku Kogyo Co., Ltd (JP) 1986-09-03 EP claimed
JP-2035461-A None JP disclosed
US-20250155846-A1 VOLUME HOLOGRAM LAMINATE, METHOD FOR PRODUCING VOLUME HOLOGRAM LAMINATE, VOLUME HOLOGRAM TRANSFER FOIL, VOLUME HOLOGRAM LABEL, VOLUME HOLOGRAM SHEET FOR EMBEDDING, CARD, AND HOLOGRAM STICKER-TYPE PRODUCT DAI NIPPON PRINTING CO., LTD. (JP) 2025-05-15 US disclosed
WO-2024228369-A1 OPTICAL ELEMENT, METHOD FOR MANUFACTURING OPTICAL ELEMENT, MATERIAL SET, OPTICAL APPARATUS, AND SYSTEM ソニーグループ株式会社 2024-11-07 WO disclosed
EP-4459379-A1 VOLUME HOLOGRAM LAMINATE, METHOD FOR PRODUCING VOLUME HOLOGRAM LAMINATE, VOLUME HOLOGRAM TRANSFER FOIL, VOLUME HOLOGRAM LABEL, VOLUME HOLOGRAM SHEET FOR EMBEDDING, CARD, AND HOLOGRAM STICKER-TYPE PRODUCT Dai Nippon Printing Co., Ltd. (JP) 2024-11-06 EP disclosed
WO-2024158026-A1 PHOTOSENSITIVE COMPOSITION FOR FORMING HOLOGRAM LAYER 大日本印刷株式会社 2024-08-02 WO disclosed
CN-114207043-B Composition for producing siliceous film having low dielectric constant and method for producing cured film and electronic device using the same 默克专利有限公司 2023-09-15 CN disclosed
EP-4010441-B1 LOW DIELECTRIC CONSTANT SILICEOUS FILM MANUFACTURING COMPOSITION AND METHODS FOR PRODUCING CURED FILM AND ELECTRONIC DEVICE USING THE SAME MERCK PATENT GMBH (DE) 2023-09-06 EP disclosed
WO-2023113043-A1 VOLUME HOLOGRAM LAMINATE, METHOD FOR PRODUCING VOLUME HOLOGRAM LAMINATE, VOLUME HOLOGRAM TRANSFER FOIL, VOLUME HOLOGRAM LABEL, VOLUME HOLOGRAM SHEET FOR EMBEDDING, CARD, AND HOLOGRAM STICKER-TYPE PRODUCT 大日本印刷株式会社 2023-06-22 WO disclosed
EP-0543409-B1 Insulated wire SUMITOMO ELECTRIC INDUSTRIES (JP) 1996-07-17 EP disclosed
US-5393612-A Conductor and insulating coating having tensile strength of at least 13 kg/mm2 SUMITOMO ELECTRIC INDUSTRIES, LTD. (JP) 1995-02-28 US disclosed
US-5356708-A Conductor and insulating coating made from polyamideimide base coating SUMITOMO ELECTRIC INDUSTRIES, LTD. (JP) 1994-10-18 US disclosed
EP-0543409-A2 Insulated wire SUMITOMO ELECTRIC INDUSTRIES, LTD (JP) 1993-05-26 EP disclosed
US-4990690-A Catalytic hydrocracking of an aroomatic carboxylic acid ester MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 1991-02-05 US disclosed
JP-H0235461-A ELECTROPHOTOGRAPHIC SENSITIVE BODY CANON INC 1990-02-06 JP disclosed
US-4831189-A PEROXIDATION USING TUNGSTEN CATALYST AND PHASE TRANSFER AGENT NIPPON SHOKUBAI KAGAKU KOGYO CO. LTD. (JP) 1989-05-16 US disclosed
EP-0193368-B1 PROCESS FOR PRODUCING AROMATIC DICARBOXYLIC ACIDS Nippon Shokubai Kagaku Kogyo Co., Ltd (JP) 1989-01-11 EP disclosed
EP-0193368-A1 Process for producing aromatic dicarboxylic acids Nippon Shokubai Kagaku Kogyo Co., Ltd (JP) 1986-09-03 EP disclosed