⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2321118 | 0.67 | — | — | |
| SCHEMBL577191 | 0.66 | — | — | |
| SCHEMBL576441 | 0.63 | — | — | |
| SCHEMBL18386567 | 0.53 | — | — | |
| SCHEMBL18148592 | 0.51 | — | — | |
| SCHEMBL592665 | 0.51 | — | — | |
| SCHEMBL17374661 | 0.50 | — | — | |
| SCHEMBL16878739 | 0.47 | — | — | |
| SCHEMBL10404 | 0.46 | — | — | |
| SCHEMBL5904396 | 0.46 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-111261512-A | Method for etching semiconductor structure using etching gas | 乔治洛德方法研究和开发液化空气有限公司 | 2020-06-09 | — | — | CN | disclosed |
| CN-105580116-B | Method for etching semiconductor structure using etching gas | 乔治洛德方法研究和开发液化空气有限公司 | 2020-02-07 | — | — | CN | disclosed |