SCHEMBL28371626

SCHEMBL28371626

CCCCCCCOC(=O)Oc1cccc2cc3cc4ccccc4cc3cc12

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ELANE P08246 3/20 0.49
▸ LMNA P02545 2/20 0.46
▸ TSHR P16473 2/20 0.46
▸ ALDH1A1 P00352 2/20 0.46
▸ CYP3A4 P08684 2/20 0.45
▸ MEN1 O00255 1/20 0.45
▸ NR1I2 O75469 1/20 0.45
▸ CHRM2 P08172 1/20 0.45
▸ ADRA2A P08913 1/20 0.45
▸ MAPT P10636 1/20 0.45
▸ OPRK1 P41145 1/20 0.45
▸ HTR2B P41595 1/20 0.45
▸ SLC6A3 Q01959 1/20 0.45
▸ KMT2A Q03164 1/20 0.45
▸ HDAC6 Q9UBN7 1/20 0.45
▸ CNR1 P21554 2/20 0.44
▸ CNR2 P34972 2/20 0.44
▸ TP53 P04637 1/20 0.43
▸ MAPK1 P28482 1/20 0.43
▸ CYP2C9 P11712 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28375509 1.00 ELANE (0.49) ELANELMNATSHRALDH1A1CYP3A4
SCHEMBL28376495 1.00 ELANE (0.49) ELANELMNATSHRALDH1A1CYP3A4
SCHEMBL28371720 0.99 ELANE (0.50) ELANELMNATSHRALDH1A1CYP3A4
SCHEMBL28379528 0.99 ELANE (0.50) ELANELMNATSHRALDH1A1CYP3A4
SCHEMBL28384040 0.99 ELANE (0.50) ELANELMNATSHRALDH1A1CYP3A4
SCHEMBL28383707 0.99 ELANE (0.50) ELANELMNATSHRALDH1A1CYP3A4
SCHEMBL28387683 0.99 ELANE (0.50) ELANELMNATSHRALDH1A1CYP3A4
SCHEMBL28887218 0.99 ELANE (0.50) ELANELMNATSHRALDH1A1CYP3A4
SCHEMBL28379931 0.99 ELANE (0.50) ELANELMNATSHRALDH1A1CYP3A4
SCHEMBL28379152 0.99 ELANE (0.50) ELANELMNATSHRALDH1A1CYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-112394617-A Photosensitive resin composition, method for producing patterned cured film, and patterned cured film 东京应化工业株式会社 2021-02-23 — — CN disclosed
CN-111796482-A Photosensitive resin composition, method for producing patterned cured film, and patterned cured film 东京应化工业株式会社 2020-10-20 — — CN disclosed
CN-110955114-A Photosensitive resin composition, method for producing patterned cured film, and cured film 东京应化工业株式会社 2020-04-03 — — CN disclosed
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