SCHEMBL28404191

SCHEMBL28404191

CCCCCCCCCS(=O)(=O)ON1C(=O)c2cccc3cccc(c23)C1=O

nearest known ligand 0.60

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 1/20 0.60
KDM4E B2RXH2 9/20 0.52
ALDH1A1 P00352 8/20 0.52
HPGD P15428 7/20 0.52
KMT2A Q03164 4/20 0.52
MAPT P10636 3/20 0.52
MEN1 O00255 3/20 0.52
HTT P42858 1/20 0.52
LMNA P02545 1/20 0.49
THRB P10828 1/20 0.49
CYP1B1 Q16678 1/20 0.47
HSD17B10 Q99714 2/20 0.41
CYP3A4 P08684 1/20 0.41
NFKB1 P19838 1/20 0.41
SMN1; SMN2 Q16637 2/20 0.40
RECQL P46063 2/20 0.40
POLB P06746 2/20 0.40
CASP1 P29466 1/20 0.40
MPI P34949 1/20 0.40
CACNA1B Q00975 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5707416 1.00 TDP1 (0.60) TDP1KDM4EALDH1A1HPGDKMT2A
SCHEMBL28223364 1.00 TDP1 (0.60) TDP1KDM4EALDH1A1HPGDKMT2A
SCHEMBL11040638 1.00 TDP1 (0.60) TDP1KDM4EALDH1A1HPGDKMT2A
SCHEMBL28418011 1.00 TDP1 (0.60) TDP1KDM4EALDH1A1HPGDKMT2A
SCHEMBL28051462 0.99 TDP1 (0.62) TDP1KDM4EALDH1A1HPGDKMT2A
SCHEMBL5019504 0.95 TDP1 (0.63) TDP1KDM4EALDH1A1HPGDKMT2A
SCHEMBL5019503 0.89 TDP1 (0.58) TDP1KDM4EALDH1A1HPGDKMT2A
SCHEMBL11029444 0.88 KDM4E (0.50) TDP1KDM4EALDH1A1HPGDKMT2A
SCHEMBL2901056 0.88 KDM4E (0.50) TDP1KDM4EALDH1A1HPGDKMT2A
SCHEMBL11025672 0.88 KDM4E (0.50) TDP1KDM4EALDH1A1HPGDKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-111324013-B Chemically amplified positive photosensitive resin composition and application thereof 奇美实业股份有限公司 2023-12-01 CN disclosed
CN-116360211-A Chemically amplified positive photosensitive resin composition, protective film, and element having protective film 奇美实业股份有限公司 2023-06-30 CN disclosed
CN-111381438-B Chemically amplified positive photosensitive resin composition and application thereof 奇美实业股份有限公司 2023-06-20 CN disclosed
CN-115437214-A Chemically amplified positive photosensitive resin composition, protective film, and element having protective film 奇美实业股份有限公司 2022-12-06 CN disclosed
CN-107561863-B Positive photosensitive resin composition and application thereof 奇美实业股份有限公司 2022-09-16 CN disclosed
CN-113126435-A Chemically amplified positive photosensitive resin composition and use thereof 奇美实业股份有限公司 2021-07-16 CN disclosed
CN-112394618-A Chemically amplified positive photosensitive resin composition, and protective film and member produced therefrom 奇美实业股份有限公司 2021-02-23 CN disclosed
CN-111999980-A Chemically amplified positive photosensitive resin composition, protective film and module 奇美实业股份有限公司 2020-11-27 CN disclosed
CN-111381442-A Chemically amplified positive photosensitive resin composition and use thereof 奇美实业股份有限公司 2020-07-07 CN disclosed
CN-111381438-A Chemically amplified positive photosensitive resin composition and use thereof 奇美实业股份有限公司 2020-07-07 CN disclosed
CN-111324013-A Chemically amplified positive photosensitive resin composition and use thereof 奇美实业股份有限公司 2020-06-23 CN disclosed
CN-106909028-B Photosensitive resin composition, protective film and liquid crystal display element 奇美实业股份有限公司 2020-06-05 CN disclosed
CN-104950580-B Photosensitive polysiloxane composition and application thereof 奇美实业股份有限公司 2020-01-03 CN disclosed