⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Benzoic Acid SCHEMBL1759391 | 0.78 | — | — | |
| Phenol SCHEMBL9100774 | 0.60 | — | — | |
| SCHEMBL1221734 | 0.60 | — | — | |
| Phenylacetic Acid SCHEMBL6047713 | 0.59 | AKR1B1 (0.39) | — | |
| SCHEMBL5187887 | 0.53 | — | — | |
| Toluene SCHEMBL451397 | 0.52 | — | — | |
| Terephthalic Acid SCHEMBL9621388 | 0.52 | TSHR (0.41) | — | |
| Fluorobenzene SCHEMBL1977585 | 0.52 | — | — | |
| Chlorobenzene SCHEMBL1976868 | 0.52 | — | — | |
| SCHEMBL3066251 | 0.52 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 33 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5686551-A | DIHYDROXYSTILBENES, DIGLYCIDYL ETHERS | THE DOW CHEMICAL COMPANY (US) | 1997-11-11 | — | — | US | claimed |
| US-20230106477-A1 | COMPOSITE, SLURRY COMPOSITION, FILM, AND METAL-CLAD LAMINATE | ENEOS CORPORATION (JP) | 2023-04-06 | — | — | US | disclosed |
| US-8436118-B2 | Synthesis of acylarylenes and hyperbranched poly(aclarylene)s by metal-free cyclotrimerization of alkynes | THE HONG KONG UNIVERSITY OF SCIENCE AND TECHNOLOGY (CN) | 2013-05-07 | — | — | US | disclosed |
| EP-1087263-B1 | Photosensitive resin composition and patterning method | HITACHI CHEM DUPONT MICROSYS (JP) | 2012-07-04 | — | — | EP | disclosed |
| US-20100129757-A1 | SYNTHESIS OF ACYLARYLENES AND HYPERBRANCHED POLY(ACLARYLENE)S BY METAL-FREE CYCLOTRIMERIZATION OF ALKYNES | THE HONG KONG UNIVERSITY OF SCIENCE AND TECHNOLOGY (CN) | 2010-05-27 | — | — | US | disclosed |
| WO-2008151499-A1 | SYNTHESIS OF ACYLARYLENES AND HYPERBRANCHED POLY(ACYLARYLENE)S BY METAL-FREE CYCLOTRIMERIZATION OF ALKYNES | THE HONG KONG UNIVERSITY OF SCIENCE AND TECHNOLOGY (CN) | 2008-12-18 | — | — | WO | disclosed |
| US-6773866-B2 | AROMATIC POLYIMIDE PRECURSOR, WHEREIN A 10 MU M THICK POLYIMIDE FILM MADE FROM THE RESIN AND DEPOSITED ON A SILICON SUBSTRATE HAS LIGHT TRANSMITTANCE AT A WAVELENGTH OF 365 NM OF AT LEAST 1% AND A RESIDUAL STRESS OF AT MOST 25 MPA. | HITACHI CHEMICAL DUPONT MICROSYSTEMS L.L.C. | 2004-08-10 | — | — | US | disclosed |
| US-20020098444-A1 | Photosensitive resin composition, patterning method, and electronic components | HITACHI CHEMICAL DUPONT MICROSYSTEMS L.L.C. (US) | 2002-07-25 | — | — | US | disclosed |
| US-6342333-B1 | HEAT RESISTANT PHOTORESISTS; AROMATIC POLYIMIDE PRECURSORS HAVING AN INCREASED I-LINE TRANSPARENCY WHICH CAN BE IMIDIZED RESINS WITH LOW COEFFICIENT OF THERMAL EXPANSION AND LOW MECHANICAL STRESS ON SILICON WAFERS; HIGH RESOLUTION; AQUEOUS | HITACHI CHEMICAL DUPONT MICROSYSTEMS, L.L.C. | 2002-01-29 | — | — | US | disclosed |
| EP-1087263-A2 | Photosensitive resin composition, pattering method, and electronic components | Hitachi Chemical DuPont MicroSystems Ltd. (JP) | 2001-03-28 | — | — | EP | disclosed |
| US-4722809-A | BLEND WITH HAOLGENATED AROMATIC POLYCARBONATE | THE DOW CHEMICAL COMPANY (US) | 1988-02-02 | — | — | US | disclosed |
| US-4649180-A | HYDROLYTIC AND THERMAL STABILITY | THE DOW CHEMICAL COMPANY (US) | 1987-03-10 | — | — | US | disclosed |
| US-4338428-A | Novel polyamides from ketene-aminals | THE UPJOHN COMPANY (US) | 1982-07-06 | — | — | US | disclosed |
| US-4178432-A | THERMOPLASTIC MOLDING MATERIALS; HEAT AND OXIDATION RESISTANCE | THE UPJOHN COMPANY (US) | 1979-12-11 | — | — | US | disclosed |
| US-4115372-A | SOLVENT SOLUBLE, INJECTION MOLDABLE | THE UPJOHN COMPANY (US) | 1978-09-19 | — | — | US | disclosed |
| US-4076537-A | Light-sensitive materials containing organo tellurium or selenium compounds and sensitizers | FUJI PHOTO FILM CO., LTD. (JA) | 1978-02-28 | — | — | US | disclosed |
| US-4076530-A | Dry photographic copying method for producing Te images | FUJI PHOTO FILM CO., LTD. (JA) | 1978-02-28 | — | — | US | disclosed |
| US-4072665-A | Polyamide from arylene diamine, isophthalic acid and alkylene dicarboxylic acid | THE UPJOHN COMPANY (US) | 1978-02-07 | — | — | US | disclosed |
| US-4065441-A | Copolyamide from arylene diamine and mixture of alkylene dicarboxylic acids | THE UPJOHN COMPANY (US) | 1977-12-27 | — | — | US | disclosed |
| US-4062685-A | ORGANO-TELLURIUM COMPOUND | FUJI PHOTO FILM CO., LTD. (JA) | 1977-12-13 | — | — | US | disclosed |