SCHEMBL284625

SCHEMBL284625

CC(C)C1(N)CCCC1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20104792 0.97 TSHR (0.31)
SCHEMBL283957 0.97 TSHR (0.31)
SCHEMBL284685 0.97 TSHR (0.31)
Fluoride SCHEMBL7235981 0.94
SCHEMBL1440208 0.94
SCHEMBL27883620 0.94
SCHEMBL27867361 0.94
SCHEMBL5223433 0.93
SCHEMBL1764782 0.86
Hydrochloric Acid SCHEMBL1936868 0.83

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 95 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024135498-A1 RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, AND COMPOUND 東京応化工業株式会社 2024-06-27 WO disclosed
WO-2024122425-A1 RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, COMPOUND, AND ACID DIFFUSION CONTROL AGENT 東京応化工業株式会社 2024-06-13 WO disclosed
WO-2023223865-A1 RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, COMPOUND, AND ACID DIFFUSION CONTROL AGENT 東京応化工業株式会社 2023-11-23 WO disclosed
WO-2023223897-A1 RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, AND COMPOUND 東京応化工業株式会社 2023-11-23 WO disclosed
WO-2023210520-A1 RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, AND COMPOUND 東京応化工業株式会社 2023-11-02 WO disclosed
WO-2023195407-A1 RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN 東京応化工業株式会社 2023-10-12 WO disclosed
WO-2023171739-A1 RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, COMPOUND, AND POLYMER COMPOUND 東京応化工業株式会社 2023-09-14 WO disclosed
WO-2023171670-A1 RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, COMPOUND, AND POLYMER COMPOUND 東京応化工業株式会社 2023-09-14 WO disclosed
WO-2023171743-A1 RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, COMPOUND, AND POLYMER 東京応化工業株式会社 2023-09-14 WO disclosed
WO-2023163008-A1 RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, COMPOUND, AND POLYMER COMPOUND 東京応化工業株式会社 2023-08-31 WO disclosed
EP-2314736-A1 RUST-PREVENTIVE OIL COMPOSITION JX Nippon Oil & Energy Corporation (JP) 2011-04-27 EP disclosed
US-20100093568-A1 REFRIGERATOR OIL, COMPRESSOR OIL COMPOSITION, HYDRAULIC FLUID COMPOSITION, METALWORKING FLUID COMPOSITION, HEAT TREATMENT OIL COMPOSITION, LUBRICANT COMPOSITION FOR MACHINE TOOL AND LUBRICANT COMPOSITION NIPPON OIL CORPORATION (JP) 2010-04-15 US disclosed
CN-101484560-A Refrigerator oil, compressor oil composition, hydraulic working oil composition, metal working oil composition, heat treatment oil composition, lubricating oil composition for machine tool, and lubricating oil composition NIPPON OIL CORP (JP) 2009-07-15 CN disclosed
EP-2039746-A1 REFRIGERATOR OIL, COMPRESSOR OIL COMPOSITION, HYDRAULIC FLUID COMPOSITION, METALWORKING FLUID COMPOSITION, HEAT TREATMENT OIL COMPOSITION, LUBRICANT COMPOSITION FOR MACHINE TOOL AND LUBRICANT COMPOSITION Nippon Oil Corporation (JP) 2009-03-25 EP disclosed
US-20080058235-A1 Lubricative Composition for Industrial Machinery and Equipment NIPPON OIL CORPORATION (JP) 2008-03-06 US disclosed
CN-1938408-A Lubricating composition for industrial machinery NIPPON OIL CORP (JP) 2007-03-28 CN disclosed
EP-1734103-A1 LUBRICATING OIL COMPOSITION FOR INDUSTRIAL MACHINERY AND EQUIPMENT Nippon Oil Corporation (JP) 2006-12-20 EP disclosed
EP-1394289-A1 RUST-PREVENTIVE OIL COMPOSITION Nippon Mitsubishi Oil Corporation (JP) 2004-03-03 EP disclosed
CN-1058049-C Lubricant composition for slide guide rail NIPPON PETROLEUM CO LTD (JP) 2000-11-01 CN disclosed
CN-1167139-A Lubricant composition for slide guide rail NIPPON PETROLEUM CO LTD (JP) 1997-12-10 CN disclosed