Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP2D6 | P10635 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL366099 | 0.96 | — | — | |
| Hydrochloric Acid SCHEMBL20590094 | 0.93 | CYP2D6 (0.41) | CYP2D6 | |
| Ammonia Solution, Strong SCHEMBL23111276 | 0.93 | CYP2D6 (0.41) | CYP2D6 | |
| Bromide SCHEMBL25379360 | 0.93 | CYP2D6 (0.41) | CYP2D6 | |
| Hydrochloric Acid SCHEMBL2316396 | 0.93 | CYP2D6 (0.41) | CYP2D6 | |
| Hydrochloric Acid SCHEMBL28843258 | 0.90 | CYP2D6 (0.39) | CYP2D6 | |
| SCHEMBL20863059 | 0.76 | CYP2D6 (0.54) | CYP2D6 | |
| SCHEMBL6298876 | 0.76 | CYP2D6 (0.39) | CYP2D6 | |
| SCHEMBL4946691 | 0.74 | — | — | |
| Iodide SCHEMBL3390258 | 0.73 | CYP2D6 (0.37) | CYP2D6 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-112292477-A | Cyclic deposition methods for forming metal-containing materials and films and structures containing metal-containing materials | ASM IP私人控股有限公司 | 2021-01-29 | — | — | CN | disclosed |
| CN-112292478-A | Cyclic deposition methods for forming metal-containing materials and films and structures containing metal-containing materials | ASM IP私人控股有限公司 | 2021-01-29 | — | — | CN | disclosed |
| CN-111684105-A | Method for forming a film containing a transition metal on a substrate by a cyclic deposition process, method for supplying a transition metal halide compound to a reaction chamber and related vapor deposition apparatus | ASM IP私人控股有限公司 | 2020-09-18 | — | — | CN | disclosed |