⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2572573 | 0.58 | — | — | |
| SCHEMBL18614843 | 0.41 | — | — | |
| SCHEMBL1519 | 0.41 | — | — | |
| SCHEMBL689 | 0.41 | — | — | |
| SCHEMBL384676 | 0.33 | — | — | |
| SCHEMBL384677 | 0.33 | — | — | |
| SCHEMBL1458384 | 0.33 | — | — | |
| SCHEMBL1130909 | 0.33 | — | — | |
| Potassium Ion SCHEMBL23462189 | 0.00 | CA4 (0.50) | — | |
| Water O 15 SCHEMBL25428717 | 0.00 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 712 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260110958-A1 | MASKS, METHODS OF MANUFACTURING MASKS, AND METHODS OF MANUFACTURING SEMICONDUCTOR DEVICE | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2026-04-23 | — | — | US | claimed |
| US-20260031346-A1 | CATHODE MATERIAL CONTAINING HALOGEN-OXYGEN COMPOUND, METHOD FOR PREPARING SAME, AND CATHODE PLATE | Eastern Institute for Advanced Study (CN) | 2026-01-29 | — | — | US | claimed |
| US-12497692-B2 | Halogen resistant coatings and methods of making and using thereof | APPLIED MATERIALS, INC. (US) | 2025-12-16 | — | — | US | claimed |
| US-20250294791-A1 | SEMICONDUCTOR STRUCTURE | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2025-09-18 | — | — | US | claimed |
| WO-2025151418-A1 | DIETHYL ZINC AND METAL HALIDE PRECURSORS FOR DEPOSITION OF METAL FILMS ON SEMICONDUCTOR SUBSTRATES | APPLIED MATERIALS, INC. (US) | 2025-07-17 | — | — | WO | claimed |
| US-20250230544-A1 | DIETHYL ZINC AND METAL HALIDE PRECURSORS FOR DEPOSITION OF METAL FILMS ON SEMICONDUCTOR SUBSTRATES | APPLIED MATERIALS, INC. (US) | 2025-07-17 | — | — | US | claimed |
| US-12356646-B2 | Semiconductor device and method for manufacturing the same | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2025-07-08 | — | — | US | claimed |
| CN-118880278-B | Composite material, preparation method and application thereof | 湖南德智新材料股份有限公司 | 2024-12-13 | — | — | CN | claimed |
| CN-118703979-B | Composite material, preparation method and application thereof | 湖南德智新材料股份有限公司 | 2024-12-10 | — | — | CN | claimed |
| CN-118954616-A | Positive electrode material containing amorphous halogen-oxygen compound and preparation method and application thereof | 宁波市东方理工高等研究院 | 2024-11-15 | — | — | CN | claimed |
| US-6328947-B1 | HYDROLYZING METAL HALIDE IN THE PRESENCE OF ORGANIC SOLVENT TO OBTAIN FINE PARTICLES OF METAL OXIDE | SHOWA DENKO K.K. (JP) | 2001-12-11 | — | — | US | claimed |
| WO-2000065125-A1 | PECVD OF TaN FILMS FROM TANTALUM HALIDE PRECURSORS | TOKYO ELECTRON LIMITED (JP) | 2000-11-02 | — | — | WO | claimed |
| WO-2000065124-A1 | PLASMA TREATMENT OF THERMAL CVD TAN FILMS FROM TANTALUM HALIDE PRECURSORS | TOKYO ELECTRON LIMITED (JP) | 2000-11-02 | — | — | WO | claimed |
| WO-2000065122-A1 | CVD OF INTEGRATED Ta AND TaNx FILMS FROM TANTALUM HALIDE PRECURSORS | TOKYO ELECTRON LIMITED (JP) | 2000-11-02 | — | — | WO | claimed |
| WO-2000065123-A1 | THERMAL CVD OF TaN FILMS FROM TANTALUM HALIDE PRECURSORS | TOKYO ELECTRON LIMITED (JP) | 2000-11-02 | — | — | WO | claimed |
| WO-2000065126-A1 | CVD TANTALUM NITRIDE PLUG FORMATION FROM TANTALUM HALIDE PRECURSORS | TOKYO ELECTRON LIMITED (JP) | 2000-11-02 | — | — | WO | claimed |
| US-5491028-A | Enhanced adherence of diamond coatings | TRUSTEES OF BOSTON UNIVERSITY (US) | 1996-02-13 | — | — | US | claimed |
| US-5433977-A | Enhanced adherence of diamond coatings by combustion flame CVD | TRUSTEES OF BOSTON UNIVERSITY (US) | 1995-07-18 | — | — | US | claimed |
| US-5324616-A | Encapsulated toner compositions and processes thereof | XEROX CORPORATION (US) | 1994-06-28 | — | — | US | claimed |
| US-4784160-A | Implantable device having plasma sprayed ceramic porous surface | CORDIS CORPORATION (US) | 1988-11-15 | — | — | US | claimed |