SCHEMBL284767

SCHEMBL284767

C[O-].C[O-].C[O-].C[O-].C[O-].[Nb+5]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14057680 0.75
SCHEMBL107861 0.75
SCHEMBL187575 0.75
SCHEMBL1236134 0.75
SCHEMBL4415510 0.75
SCHEMBL25254193 0.75
SCHEMBL11298649 0.75
SCHEMBL1406232 0.75
SCHEMBL489988 0.75
SCHEMBL450663 0.75

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 199 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-122011495-A Preparation method of interpenetrating network phenolic aerogel and carbon aerogel and electromagnetic shielding application thereof 哈尔滨工业大学 2026-05-12 CN claimed
CN-118638257-A High-entropy ceramic organic precursor and preparation method and application thereof 国投陶瓷基复合材料研究院(西安)有限公司 2024-09-13 CN claimed
US-6616965-B1 Making a hydrated mixed metal oxide sol by combining an aluminum alkoxide, with a niobium and/or tantalum alkoxide in the presence of UV light to provide a water-free precursor; and combining the precursor with a ketone AGERE SYSTEMS INC. 2003-09-09 US claimed
US-20010040785-A1 Thin film deposition of mixed metal oxides HILCO PATENT ACQUISITION 56, LLC 2001-11-15 US claimed
US-6312565-B1 Thin film deposition of mixed metal oxides AGERE SYSTEMS GUARDIAN CORP. 2001-11-06 US claimed
US-5271797-A Method for patterning metal oxide thin film ROHM CO., LTD. (JP) 1993-12-21 US claimed
US-4931573-A CATALYTIC HYDROGENATION OF DICARBOXYLIC ACID, ESTER OR ANHYDRIDE WITH RUTHENIUM, PHOSPHINES AND GROUPS 3,4,5 COMPOUNDS MITSUBISHI KASEI CORPORATION (JP) 1990-06-05 US claimed
JP-7252511-A None JP disclosed
JP-3083941-A None JP disclosed
CN-122011495-A Preparation method of interpenetrating network phenolic aerogel and carbon aerogel and electromagnetic shielding application thereof 哈尔滨工业大学 2026-05-12 CN disclosed
US-20250158032-A1 COATED POSITIVE ELECTRODE ACTIVE MATERIAL FOR LITHIUM SECONDARY BATTERIES AND LITHIUM SECONDARY BATTERY SUMITOMO METAL MINING CO., LTD. (JP) 2025-05-15 US disclosed
CN-119816958-A Positive electrode active material for lithium secondary battery, electrode for lithium secondary battery, and lithium secondary battery 住友化学株式会社 2025-04-11 CN disclosed
US-12257557-B2 Bonded body, separation membrane module equipped with same, and method for producing alcohol MITSUBISHI CHEMICAL CORPORATION (JP) 2025-03-25 US disclosed
US-5073649-A Reacting ammonia, alkylenamines and alkanolamine in presence of niobium-containing catalyst TOSOH CORPORATION (JP) 1991-12-17 US disclosed
JP-H0383941-A SYNTHESIS OF METAL ALKOXIDE CHIYUUGAI TEKUNOSU KK 1991-04-09 JP disclosed
US-4931573-A CATALYTIC HYDROGENATION OF DICARBOXYLIC ACID, ESTER OR ANHYDRIDE WITH RUTHENIUM, PHOSPHINES AND GROUPS 3,4,5 COMPOUNDS MITSUBISHI KASEI CORPORATION (JP) 1990-06-05 US disclosed
US-4906782-A Process for preparation of alkyleneamines TOYO SODA MANUFACTURING CO., LTD. (JP) 1990-03-06 US disclosed
EP-0328101-A2 Process for producing alkylenamines Tosoh Corporation (JP) 1989-08-16 EP disclosed
EP-0256516-A2 Process for preparation of alkyleneamines Tosoh Corporation (JP) 1988-02-24 EP disclosed
US-4108970-A PROCESS FOR PRODUCING LITHIUM NIOBATE AND LITHIUM TANTALATE BELL TELEPHONE LABORATORIES, INCORPORATED (US) 1978-08-22 US disclosed