SCHEMBL285331

SCHEMBL285331

CN(CO)C(CO)(CO)C(=O)O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL28072308 0.98
Water SCHEMBL28121532 0.95
SCHEMBL5158079 0.72 TDP1 (0.38)
SCHEMBL21436928 0.67 OR51E2 (0.30)
SCHEMBL28196187 0.67 TSHR (0.41)
SCHEMBL16340642 0.65 MAPT (0.35)
SCHEMBL18362436 0.65 TDP1 (0.36)
Ammonia Solution, Strong SCHEMBL27772784 0.63 TSHR (0.37)
SCHEMBL10801969 0.63 TDP1 (0.35)
SCHEMBL27281395 0.63 MAPT (0.38)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1713 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116917446-B Hydroprocessing process using catalyst sequences with nickel, molybdenum and tungsten based catalysts IFP Energies Nouvelles (FR) 2026-05-26 CN claimed
CN-116113826-B Concentrating device, concentrating method for body fluid to be tested, testing method for body fluid to be tested, and testing kit 富士胶片株式会社 2026-02-27 CN claimed
CN-120152694-A Stabilized fragrance compositions and uses thereof 弗门尼舍有限公司 2025-06-13 CN claimed
CN-120153039-A Slurry composition for chemical mechanical polishing and method for manufacturing semiconductor device 秀博瑞殷株式公社 2025-06-13 CN claimed
CN-120153038-A Slurry composition for chemical mechanical polishing and method for manufacturing semiconductor device 秀博瑞殷株式公社 2025-06-13 CN claimed
CN-120153040-A Slurry composition for chemical mechanical polishing and method for manufacturing semiconductor device 秀博瑞殷株式公社 2025-06-13 CN claimed
CN-120129729-A Slurry composition for chemical mechanical polishing and method for manufacturing semiconductor device 秀博瑞殷株式公社 2025-06-10 CN claimed
CN-120129730-A Slurry composition for chemical mechanical polishing and method for manufacturing semiconductor device 秀博瑞殷株式公社 2025-06-10 CN claimed
US-12312565-B2 Low-VOC cleaning substrates and compositions comprising an eo-po block copolymer non-ionic surfactant THE CLOROX COMPANY (US) 2025-05-27 US claimed
CN-119955899-A Compositions, methods and kits for stabilizing coelenterazine and analogs and derivatives thereof 普洛麦格公司 2025-05-09 CN claimed
US-5561058-A AMPLIFYING RNA TARGETS HOFFMANN-LA ROCHE INC. (US) 1996-10-01 US claimed
WO-1996014879-A9 METHODS FOR USE OF NOVEL LYOPROTECTANTS AND INSTANT KIT FORMULATIONS FOR RADIOPHARMACEUTICALS USING THE SAME 1996-09-06 WO claimed
EP-0578814-B1 CAPILLARY COLUMN CONTAINING A DYNAMICALLY CROSS-LINKED COMPOSITION AND METHOD OF USE BECKMAN INSTRUMENTS INC (US) 1996-08-14 EP claimed
US-5464516-A Process for producing an electrophoresis separation layer HYMO CORPORATION (JP) 1995-11-07 US claimed
US-5376310-A Alkaline light duty dishwashing detergent composition containing an alkyl ethoxy carboxylate surfactant, magnesium ions, chelator and buffer THE PROCTER & GAMBLE CO. (US) 1994-12-27 US claimed
US-5290764-A Aqueous buffer and monosaccharide or disaccharide, treatment of fibrinolysis THE DUPONT MERCK PHARMACEUTICAL COMPANY (US) 1994-03-01 US claimed
EP-0271713-A2 Method for preparing aqueous solutions containing chromogenic materials SAVYON DIAGNOSTICS LTD. (IL) 1988-06-22 EP claimed
EP-0261493-A2 Method for the determination of IgM and IgA immunoglobulins and reagents therefor SAVYON DIAGNOSTICS LTD. (IL) 1988-03-30 EP claimed
US-4302538-A Buffer system in an anti-thrombin III test ORTHO DIAGNOSTICS INC. (US) 1981-11-24 US claimed
US-4169828-A AMINOALKANECARBOXYLIC ACIDS ARCO POLYMERS, INC. (US) 1979-10-02 US claimed