SCHEMBL28567757

SCHEMBL28567757

O=C1c2ccc(O)cc2-c2ccccc2C1O

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
DYRK1A Q13627 1/20 0.50
KDM4E B2RXH2 1/20 0.44
MEN1 O00255 1/20 0.44
KMT2A Q03164 1/20 0.44
CDK5 Q00535 1/20 0.43
CDK5R1 Q15078 1/20 0.43
ESR1 P03372 4/20 0.42
ESR2 Q92731 3/20 0.42
MAOA P21397 1/20 0.42
UGT1A1 P22309 1/20 0.42
MAOB P27338 1/20 0.42
HTR7 P34969 2/20 0.40
HTR2B P41595 2/20 0.40
CYP3A4 P08684 1/20 0.38
AR P10275 1/20 0.38
CA1 P00915 1/20 0.38
CA2 P00918 1/20 0.38
CA7 P43166 1/20 0.38
CA9 Q16790 1/20 0.38
TYR P14679 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20384877 0.85 CYP1A2 (0.50) MEN1KMT2AHTR7HTR2BAR
SCHEMBL20099086 0.83 MAPT (0.45) KDM4EMEN1KMT2AMAOAHTR7
SCHEMBL5069724 0.80 DYRK1A (0.79) DYRK1AKDM4EMEN1KMT2ACDK5
SCHEMBL28413245 0.80 DYRK1A (0.59) DYRK1AKDM4EMEN1KMT2ACDK5
SCHEMBL15906510 0.79 CYP2D6 (0.47) KDM4EMEN1KMT2AMAOAMAOB
SCHEMBL10635317 0.77 CYP1A2 (0.53) DYRK1AKDM4EMEN1KMT2ACDK5
SCHEMBL23721110 0.73 MEN1 (0.46) MEN1KMT2AHTR7HTR2BMAPT
SCHEMBL10344203 0.72 MEN1 (0.55) KDM4EMEN1KMT2AMAOAHTR2B
SCHEMBL736975 0.72 CDK5 (0.64) DYRK1ACDK5CDK5R1ESR1ESR2
SCHEMBL28364176 0.72 CDK5 (0.64) DYRK1ACDK5CDK5R1ESR1ESR2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-112778447-A Soluble photosensitive resin and preparation method thereof and cured lamination inhibition method 西安交通大学 2021-05-11 CN claimed
CN-112778447-A Soluble photosensitive resin and preparation method thereof and cured lamination inhibition method 西安交通大学 2021-05-11 CN disclosed