⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL486636 | 0.73 | — | — | |
| SCHEMBL2857414 | 0.67 | — | — | |
| SCHEMBL2863902 | 0.63 | — | — | |
| SCHEMBL486517 | 0.59 | — | — | |
| SCHEMBL486600 | 0.59 | — | — | |
| SCHEMBL486779 | 0.59 | — | — | |
| Water SCHEMBL29259896 | 0.58 | — | — | |
| SCHEMBL486618 | 0.56 | — | — | |
| SCHEMBL2871599 | 0.55 | — | — | |
| SCHEMBL2869592 | 0.53 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2698802-B1 | Electrolytic capacitor | PANASONIC IP MAN CO LTD (JP) | 2018-05-16 | — | — | EP | disclosed |
| EP-1808875-B1 | ELECTROLYTE FOR ELECTROLYTIC CAPACITOR AND ELECTROLYTIC CAPACITOR UTILIZING THE SAME | PANASONIC IP MAN CO LTD (JP) | 2017-11-08 | — | — | EP | disclosed |
| EP-2698802-A1 | Electrolytic capacitor comprising a separtor comprising a conductive polymer containing a p-dopant on its surface | Panasonic Corporation (JP) | 2014-02-19 | — | — | EP | disclosed |
| US-7859828-B2 | supresses increase in the ESR (equivalent series resistance) with the elapse of time in an electrolytic capacitor is suppressed | PANASONIC CORPORATION (JP) | 2010-12-28 | — | — | US | disclosed |
| US-20100321863-A1 | ACTIVATED CARBON AND PROCESS FOR PRODUCING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-12-23 | — | — | US | disclosed |
| US-7800886-B2 | Electric double layer capacitor | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-09-21 | — | — | US | disclosed |
| US-7785495-B2 | Activated carbon prepared by carbonizing and activating a calixarene containing dihydroxybenzene rings; especially calcining at 400 degrees C. or less in the presence of an oxidative gas, calcining at 1500 degrees or less in an inactive gas, and then further calcining at 200-1500 degrees in H2O or CO2 | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-08-31 | — | — | US | disclosed |
| US-7749625-B2 | Fuel for fuel cell, fuel cell and application thereof | KURITA WATER INDUSTRIES LTD. (JP) | 2010-07-06 | — | — | US | disclosed |
| US-7675734-B2 | Electrolytic solution and electrolytic capacitor using the same | PANASONIC CORPORATION (JP) | 2010-03-09 | — | — | US | disclosed |
| EP-2093191-A1 | ACTIVATED CARBON AND METHOD FOR PRODUCING THE SAME | Sumitomo Chemical Company, Limited (JP) | 2009-08-26 | — | — | EP | disclosed |
| US-20080233438-A1 | Fuel for fuel cell, fuel cell and application thereof | KURITA WATER INDUSTRIES LTD. (JP) | 2008-09-25 | — | — | US | disclosed |
| US-20080094777-A1 | Electric double layer capacitor | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2008-04-24 | — | — | US | disclosed |
| EP-1905740-A1 | ELECTRIC DOUBLE LAYER CAPACITOR | Sumitomo Chemical Company, Limited (JP) | 2008-04-02 | — | — | EP | disclosed |
| EP-1876611-A1 | ELECTRIC DOUBLE LAYER CAPACITOR | Sumitomo Chemical Company, Limited (JP) | 2008-01-09 | — | — | EP | disclosed |
| US-20070269987-A1 | Polishing Liquid for Cmp Process and Polishing Method | SANYO CHEMICAL INDUSTRIES, LTD. (JP) | 2007-11-22 | — | — | US | disclosed |
| EP-1808875-A1 | ELECTROLYTE FOR ELECTROLYTIC CAPACITOR AND ELECTROLYTIC CAPACITOR UTILIZING THE SAME | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2007-07-18 | — | — | EP | disclosed |
| EP-1705740-A1 | FUEL FOR FUEL CELL, FUEL CELL AND APPLICATION THEREOF | Kurita Water Industries Ltd. (JP) | 2006-09-27 | — | — | EP | disclosed |
| EP-1628334-A1 | POLISHING LIQUID FOR CMP PROCESS AND POLISHING METHOD | SANYO CHEMICAL INDUSTRIES LTD. (JP) | 2006-02-22 | — | — | EP | disclosed |
| US-20050136247-A1 | Non-aqueous absorbent and use thereof | SANYO CHEMICAL INDUSTRIES, LTD. (JP) | 2005-06-23 | — | — | US | disclosed |
| EP-1462460-A1 | NON-AQUEOUS ABSORBENT AND USE THEREOF | SANYO CHEMICAL INDUSTRIES, LTD. (JP) | 2004-09-29 | — | — | EP | disclosed |