Fluoride

Fluoride

SCHEMBL2861002

F.[GaH3].[LiH].[SrH2]

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Fluoride SCHEMBL5108835 0.89
Fluoride SCHEMBL1802796 0.87
Fluoride SCHEMBL19583166 0.87
SCHEMBL7204859 0.87
SCHEMBL27489525 0.75
Water SCHEMBL27872666 0.75
Fluoride SCHEMBL28131673 0.75
Fluoride SCHEMBL15194435 0.75
Fluoride SCHEMBL4430734 0.75
Fluoride SCHEMBL1274182 0.75

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0759574-B1 SECOND HARMONIC GENERATOR AND LASER APPLICATION APPARATUS MELLES GRIOT INC (US) 2003-11-05 EP claimed
US-6047010-A Second harmonic generator and laser applied units HITACHI METALS, LTD. (JP) 2000-04-04 US claimed
CN-1046165-C Second harmonic generator and laser application appts. HITACHI METALS LTD (JP) 1999-11-03 CN claimed
CN-1145670-A second harmonic oscillator and laser application device HITACHI METALS LTD (JP) 1997-03-19 CN claimed
EP-0759574-A1 SECOND HARMONIC GENERATOR AND LASER APPLICATION APPARATUS HITACHI METALS CO. LTD. (JP) 1997-02-26 EP claimed
JP-9232664-A None JP disclosed
EP-1829170-B1 THERMALLY SELF-CORRECTING GAIN MODULES AND ASSOCIATED SYSTEMS AND METHODS TEXTRON SYSTEMS CORP (US) 2010-08-18 EP disclosed
US-7764414-B2 Illumination apparatus and illumination method LASERTEC CORPORATION (JP) 2010-07-27 US disclosed
US-7643523-B2 Thermally self-correcting gain modules and associated systems and methods TEXTRON SYSTEMS CORPORATION (US) 2010-01-05 US disclosed
US-20080144148-A1 ILLUMINATION APPARATUS AND ILLUMINATION METHOD LASERTEC CORPORATION (JP) 2008-06-19 US disclosed
US-20080069161-A1 THERMALLY SELF-CORRECTING GAIN MODULES AND ASSOCIATED SYSTEMS AND METHODS TEXTRON SYSTEMS CORPORATION (US) 2008-03-20 US disclosed
US-7310359-B2 Thermally self-correcting gain modules and associated systems and methods TEXTRON SYSTEMS CORPORATION (US) 2007-12-18 US disclosed
US-6047010-A Second harmonic generator and laser applied units HITACHI METALS, LTD. (JP) 2000-04-04 US disclosed
US-6026102-A Multi element single mode microchip lasers NANOLAMBDA INC. 2000-02-15 US disclosed
CN-1046165-C Second harmonic generator and laser application appts. HITACHI METALS LTD (JP) 1999-11-03 CN disclosed
WO-1998048491-A2 MULTI-ELEMENT, SINGLE MODE MICROCHIP LASERS NEW LAMBDA CORPORATION (US) 1998-10-29 WO disclosed
JP-H09232664-A THE SECOND HAMONICS GENERATOR AND LASER APPLICATION SYSTEM HITACHI METALS LTD 1997-09-05 JP disclosed
CN-1145670-A second harmonic oscillator and laser application device HITACHI METALS LTD (JP) 1997-03-19 CN disclosed
EP-0759574-A1 SECOND HARMONIC GENERATOR AND LASER APPLICATION APPARATUS HITACHI METALS CO. LTD. (JP) 1997-02-26 EP disclosed
US-5276695-A Multifrequency, rapidly sequenced or simultaneous tunable laser THE UNITED STATES OF AMERICA AS REPRESENTED BY THE SECRETARY OF THE NAVY (US) 1994-01-04 US disclosed