Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 2/20 | 0.37 |
| ▸ | HTT | P42858 | 3/20 | 0.36 |
| ▸ | MEN1 | O00255 | 2/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.36 |
| ▸ | APOBEC3A | P31941 | 1/20 | 0.36 |
| ▸ | APOBEC3G | Q9HC16 | 1/20 | 0.36 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.35 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.35 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.35 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.34 |
| ▸ | TSHR | P16473 | 1/20 | 0.33 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.33 |
| ▸ | NPC1 | O15118 | 1/20 | 0.33 |
| ▸ | RAB9A | P51151 | 1/20 | 0.33 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.32 |
| ▸ | GAA | P10253 | 1/20 | 0.31 |
| ▸ | LIPA | P38571 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6382164 | 0.78 | MAPT (0.39) | MAPTHTTMEN1KMT2AAPOBEC3A | |
| SCHEMBL4552150 | 0.78 | MAPT (0.39) | MAPTHTTMEN1KMT2AAPOBEC3A | |
| SCHEMBL68265 | 0.76 | — | — | |
| SCHEMBL5270433 | 0.76 | — | — | |
| SCHEMBL5615220 | 0.76 | EPHX1 (0.42) | MAPTHTTMEN1KMT2AAPOBEC3A | |
| SCHEMBL22797 | 0.76 | — | — | |
| SCHEMBL2720308 | 0.76 | MAPT (0.38) | MAPTHTTMEN1KMT2AAPOBEC3A | |
| SCHEMBL12384730 | 0.76 | MAPT (0.38) | MAPTHTTMEN1KMT2AAPOBEC3A | |
| SCHEMBL19272362 | 0.76 | MAPT (0.38) | MAPTHTTMEN1KMT2AAPOBEC3A | |
| SCHEMBL2719576 | 0.74 | MAPT (0.41) | MAPTHTTMEN1KMT2AAPOBEC3A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7700257-B2 | Photoresist composition and resist pattern formation method by the use thereof | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-04-20 | — | — | US | disclosed |
| US-7264918-B2 | Resist composition for liquid immersion exposure process and method of forming resist pattern therewith | TOKYO OHKA KOGYO CO., LTD. (JP) | 2007-09-04 | — | — | US | disclosed |
| US-20070148581-A1 | Photoresist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD (JP) | 2007-06-28 | — | — | US | disclosed |
| US-20070031755-A1 | Material for forming resist-protecting film for immersion exposure process, resist-protecting film made of such material, and method for forming resist pattern using such resist-protec- ting film | TOKO OHKA KOGYO CO., LTD. (JP) | 2007-02-08 | — | — | US | disclosed |
| US-20060166130-A1 | Photoresist composition and method for forming resist pattern using the same | TOKYO OHKA KOGYO CO., LTD. (JP) | 2006-07-27 | — | — | US | disclosed |
| US-20060154170-A1 | Resist composition for liquid immersion exposure process and method of forming resist pattern therewith | TOKYO OHKA KOGYO CO., LTD. (JP) | 2006-07-13 | — | — | US | disclosed |
| EP-1662323-A1 | MATERIAL FOR FORMING RESIST-PROTECTING FILM FOR IMMERSION EXPOSURE PROCESS, RESIST-PROTECTING FILM MADE OF SUCH MATERIAL, AND METHOD FOR FORMING RESIST PATTERN USING SUCH RESIST-PROTECTING FILM | TOKYO OHKA KOGYO CO., LTD. (JP) | 2006-05-31 | — | — | EP | disclosed |
| EP-1610178-A1 | RESIST COMPOSITION FOR LIQUID IMMERSION EXPOSURE PROCESS AND METHOD OF FORMING RESIST PATTERN THEREWITH | TOKYO OHKA KOGYO CO., LTD. (JP) | 2005-12-28 | — | — | EP | disclosed |
| US-6180316-B1 | SUITABLE FOR USE AS CHEMICALLY AMPLIFIED RESIST USED IN MANUFACTURING OF INTEGRATED CIRCUITS | JSR CORPORATION (JP) | 2001-01-30 | — | — | US | disclosed |
| EP-0930541-A1 | Radiation sensitive resin composition | JSR Corporation (JP) | 1999-07-21 | — | — | EP | disclosed |