Phenylacetaldehyde

Phenylacetaldehyde

SCHEMBL28638560

CNC.O=CCc1ccccc1

nearest known ligand 0.52

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAOB P27338 1/20 0.52
ADH1B P00325 1/20 0.48
ADH1C P00326 1/20 0.48
ADH1A P07327 1/20 0.48
ADH7 P40394 1/20 0.48
KDM4E B2RXH2 1/20 0.46
CYP3A4 P08684 1/20 0.46
MAPT P10636 1/20 0.46
CALM1 P0DP23 1/20 0.46
TAAR1 Q96RJ0 4/20 0.45
MEN1 O00255 3/20 0.45
KMT2A Q03164 3/20 0.45
ATM Q13315 1/20 0.44
EPHX1 P07099 1/20 0.43
TDP1 Q9NUW8 1/20 0.42
TP53 P04637 1/20 0.42
SIGMAR1 Q99720 3/20 0.41
LMNA P02545 2/20 0.41
SLC18A2 Q05940 1/20 0.41
CYP2D6 P10635 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Phenylacetaldehyde SCHEMBL8531349 0.90 MAOB (0.57) MAOBADH1BADH1CADH1AADH7
Phenylacetaldehyde SCHEMBL18972 0.89
Phenylacetaldehyde SCHEMBL31402006 0.89
Phenylacetaldehyde SCHEMBL31725265 0.89
Phenylacetaldehyde SCHEMBL3319438 0.89 MAOB (0.63) MAOBADH1BADH1CADH1AADH7
Phenylacetaldehyde SCHEMBL935399 0.89 KDM4E (0.46) MAOBADH1BADH1CADH1AADH7
Phenylacetaldehyde SCHEMBL11118870 0.87 MAOB (0.55) MAOBADH1BADH1CADH1AADH7
Phenylacetaldehyde SCHEMBL5803411 0.87 MAOB (0.60) MAOBADH1BADH1CADH1AADH7
Phenylacetaldehyde SCHEMBL9308065 0.87 MAOB (0.60) MAOBADH1BADH1CADH1AADH7
Phenylacetaldehyde SCHEMBL3115647 0.87 MAOB (0.60) MAOBADH1BADH1CADH1AADH7

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113527101-A Novel compound, polymer and method for producing same, photosensitive resin composition, method for forming pattern, cured film, and electronic component 信越化学工业株式会社 2021-10-22 CN disclosed
CN-110016136-B Novel tetracarboxylic dianhydride, polyimide resin, method for producing same, photosensitive resin composition, and method for forming pattern 信越化学工业株式会社 2021-09-24 CN disclosed