Known targets — ChEMBL curated mechanism
The experimentally established mechanism targets of Nitric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Formaldehyde SCHEMBL28767266 | 0.82 | — | — | |
| Hydrogen Sulfide SCHEMBL28142234 | 0.82 | — | — | |
| Hydrochloric Acid SCHEMBL27397644 | 0.82 | — | — | |
| Hydrochloric Acid SCHEMBL7847807 | 0.82 | — | — | |
| Methane SCHEMBL28761833 | 0.82 | — | — | |
| Water SCHEMBL28639465 | 0.82 | — | — | |
| SCHEMBL28806912 | 0.82 | — | — | |
| Formic Acid SCHEMBL27279500 | 0.81 | — | — | |
| Sulfuric Acid SCHEMBL28447459 | 0.81 | — | — | |
| Acetic Acid SCHEMBL27515703 | 0.81 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-113549399-B | Chemical mechanical polishing composition suitable for rough polishing of silicon wafer and application thereof | 万华化学集团电子材料有限公司 | 2022-02-15 | — | — | CN | claimed |
| CN-113549399-A | Chemical mechanical polishing composition suitable for rough polishing of silicon wafer and application thereof | 万华化学集团电子材料有限公司 | 2021-10-26 | — | — | CN | claimed |
| CN-113549399-B | Chemical mechanical polishing composition suitable for rough polishing of silicon wafer and application thereof | 万华化学集团电子材料有限公司 | 2022-02-15 | — | — | CN | disclosed |
| CN-113549399-A | Chemical mechanical polishing composition suitable for rough polishing of silicon wafer and application thereof | 万华化学集团电子材料有限公司 | 2021-10-26 | — | — | CN | disclosed |
| CN-110072545-A | Immunogenicity/therapeutic glycan pool object and application thereof | 台湾浩鼎生技股份有限公司 | 2019-07-30 | — | — | CN | disclosed |