SCHEMBL2864822

SCHEMBL2864822

FC(F)=C=CC(F)(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15011836 0.75
SCHEMBL2869703 0.75
SCHEMBL2869757 0.75
SCHEMBL23675036 0.71
SCHEMBL1226992 0.65
SCHEMBL8028118 0.62
SCHEMBL775999 0.60
Bromide SCHEMBL8586172 0.57
SCHEMBL3628768 0.57
SCHEMBL2362552 0.57

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6841616-B2 Polymerization of halogen-containing monomers using siloxane surfactant ARKEMA INC. (US) 2005-01-11 US claimed
US-20040192836-A1 Polymerization of halogen-containing monomers using siloxane surfactant ARKEMA INC. 2004-09-30 US claimed
EP-1462461-A1 Polymerization of halogen-containing monomers using siloxane surfactant Atofina Chemicals, Inc. (US) 2004-09-29 EP claimed
US-8535551-B2 Plasma etching method ZEON CORPORATION (JP) 2013-09-17 US disclosed
US-20100264116-A1 PLASMA ETCHING METHOD ZEON CORPORATION (JP) 2010-10-21 US disclosed
EP-2194569-A1 PLASMA ETCHING METHOD ZEON CORPORATION (JP) 2010-06-09 EP disclosed
EP-1462461-B1 Polymerization of halogen-containing monomers using siloxane surfactant ARKEMA INC (US) 2008-02-20 EP disclosed
US-6841616-B2 Polymerization of halogen-containing monomers using siloxane surfactant ARKEMA INC. (US) 2005-01-11 US disclosed
US-20040192836-A1 Polymerization of halogen-containing monomers using siloxane surfactant ARKEMA INC. 2004-09-30 US disclosed
EP-1462461-A1 Polymerization of halogen-containing monomers using siloxane surfactant Atofina Chemicals, Inc. (US) 2004-09-29 EP disclosed