SCHEMBL2865654

SCHEMBL2865654

Clc1ccc(Cc2nc(-c3cc(Cl)cc(Cl)c3)c[nH]2)cc1

nearest known ligand 0.39

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
NR1H2 P55055 1/20 0.39
PRNP P04156 1/20 0.38
MAPT P10636 1/20 0.38
HSP90AB1 P08238 1/20 0.37
DAO P14920 1/20 0.36
PDGFRB P09619 1/20 0.36
GABRA1 P14867 1/20 0.35
GABRB2 P47870 1/20 0.35
MGAM O43451 1/20 0.35
GAA P10253 1/20 0.35
SI P14410 1/20 0.35
MGAM2 Q2M2H8 1/20 0.35
TYMP P19971 1/20 0.35
MAPK1 P28482 1/20 0.35
RAB9A P51151 1/20 0.35
KMT2A Q03164 1/20 0.35
SMN1; SMN2 Q16637 1/20 0.35
TDP1 Q9NUW8 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26110472 0.89 CXCR2 (0.45) NR1H2GAARAB9A
SCHEMBL2868952 0.89 NR1H2 (0.45) NR1H2PRNPMAPTDAOPDGFRB
SCHEMBL27967854 0.89 CXCR2 (0.33) DAOPDGFRB
SCHEMBL28406405 0.88 GSK3B (0.41) MAPTSMN1; SMN2
SCHEMBL2874144 0.88 NR1H2 (0.39) NR1H2MAPTPDGFRBMGAMGAA
SCHEMBL2871545 0.87 ADORA2A (0.41) TYMPMAPK1TDP1
SCHEMBL2871695 0.85 NR1H2 (0.40) NR1H2PRNPMAPTHSP90AB1MGAM
SCHEMBL31305556 0.85 NR1H2 (0.40) NR1H2PRNPMAPTHSP90AB1MGAM
SCHEMBL2872354 0.84 NR1H2 (0.49) NR1H2PRNPMAPTGABRA1GABRB2
SCHEMBL26110389 0.84 ADORA2A (0.39) MAPTRAB9ASMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-102119240-B Surface treating agent for copper or copper alloy and use thereof SHIKOKU CHEM 2014-07-30 CN disclosed
WO-2010016620-A1 SURFACE TREATING AGENT FOR COPPER OR COPPER ALLOY AND USE THEREOF SHIKOKU CHEMICALS CORPORATION (JP) 2010-02-11 WO disclosed