SCHEMBL2866773

SCHEMBL2866773

CC(O)(C=Cc1ccccc1)CF

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP2C19 P33261 1/20 0.49
TTR P02766 1/20 0.40
ALOX5 P09917 1/20 0.40
PTGS1 P23219 1/20 0.40
PTGS2 P35354 1/20 0.40
NPC1 O15118 3/20 0.40
L3MBTL1 Q9Y468 1/20 0.40
EGFR P00533 1/20 0.40
GLA P06280 1/20 0.38
TDP1 Q9NUW8 1/20 0.38
MAOB P27338 1/20 0.38
NFE2L2 Q16236 1/20 0.38
ALDH1A1 P00352 3/20 0.37
MAPT P10636 3/20 0.37
LMNA P02545 2/20 0.37
S1PR4 O95977 1/20 0.37
S1PR1 P21453 1/20 0.37
NPSR1 Q6W5P4 1/20 0.37
PAM P19021 1/20 0.37
TSHR P16473 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7127921 0.82 CYP2C19 (0.50) CYP2C19TTRALOX5PTGS1PTGS2
SCHEMBL19130587 0.82 CYP2C19 (0.50) CYP2C19TTRALOX5PTGS1PTGS2
SCHEMBL16552541 0.82 CYP2C19 (0.50) CYP2C19TTRALOX5PTGS1PTGS2
SCHEMBL7127915 0.82 CYP2C19 (0.50) CYP2C19TTRALOX5PTGS1PTGS2
SCHEMBL28149239 0.79 CYP2C19 (0.47) CYP2C19TTRALOX5PTGS1PTGS2
SCHEMBL2939919 0.78 CYP2C19 (0.54) CYP2C19NPC1L3MBTL1EGFRGLA
SCHEMBL2939921 0.78 CYP2C19 (0.54) CYP2C19NPC1L3MBTL1EGFRGLA
SCHEMBL560995 0.77 CYP2C19 (0.57) CYP2C19TTRALOX5PTGS1PTGS2
SCHEMBL7903413 0.77 CYP2C19 (0.57) CYP2C19TTRALOX5PTGS1PTGS2
SCHEMBL28944425 0.77 CYP2C19 (0.57) CYP2C19TTRALOX5PTGS1PTGS2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20100255427-A1 CONFORMAL PHOTO-SENSITIVE LAYER AND PROCESS TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) 2010-10-07 US claimed
US-20100255427-A1 CONFORMAL PHOTO-SENSITIVE LAYER AND PROCESS TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) 2010-10-07 US disclosed