⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1027088 | 0.77 | — | — | |
| SCHEMBL1031666 | 0.69 | — | — | |
| SCHEMBL1029033 | 0.69 | — | — | |
| SCHEMBL1030815 | 0.67 | TSHR (0.33) | — | |
| SCHEMBL1030535 | 0.64 | TSHR (0.31) | — | |
| SCHEMBL4324619 | 0.61 | — | — | |
| SCHEMBL563292 | 0.61 | — | — | |
| SCHEMBL1030664 | 0.61 | — | — | |
| SCHEMBL10791481 | 0.61 | TSHR (0.38) | — | |
| SCHEMBL1030591 | 0.61 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20220342301-A1 | PHOTORESIST WITH MULTIPLE PATTERNING RADIATION-ABSORBING ELEMENTS AND/OR VERTICAL COMPOSITION GRADIENT | LAM RESEARCH CORPORATION (US) | 2022-10-27 | — | — | US | claimed |
| EP-3990982-A1 | PHOTORESIST WITH MULTIPLE PATTERNING RADIATION-ABSORBING ELEMENTS AND/OR VERTICAL COMPOSITION GRADIENT | Lam Research Corporation (US) | 2022-05-04 | — | — | EP | claimed |
| CN-114270266-A | Photoresist with multiple patterned radiation absorbing elements and/or vertical compositional gradients | 朗姆研究公司 | 2022-04-01 | — | — | CN | claimed |
| CN-114270266-A | Photoresist with multiple patterned radiation absorbing elements and/or vertical compositional gradients | 朗姆研究公司 | 2022-04-01 | — | — | CN | disclosed |