Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TYR | P14679 | 3/20 | 0.60 |
| ▸ | MEN1 | O00255 | 1/20 | 0.49 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.49 |
| ▸ | ALOX5 | P09917 | 1/20 | 0.48 |
| ▸ | CES2 | O00748 | 1/20 | 0.46 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4653992 | 0.91 | TYR (0.56) | TYRMEN1KMT2ACES2 | |
| SCHEMBL31514648 | 0.88 | TYR (0.52) | TYRMEN1KMT2AALOX5 | |
| SCHEMBL156238 | 0.86 | TYR (0.60) | TYRMEN1KMT2AALOX5 | |
| SCHEMBL29419312 | 0.86 | TYR (0.60) | TYRMEN1KMT2AALOX5 | |
| SCHEMBL31536310 | 0.85 | TYR (0.53) | TYRMEN1KMT2AALOX5 | |
| SCHEMBL28875498 | 0.83 | MEN1 (0.58) | TYRMEN1KMT2AALOX5 | |
| SCHEMBL3181028 | 0.83 | TYR (0.56) | TYRMEN1KMT2AALOX5 | |
| SCHEMBL29429355 | 0.83 | TYR (0.56) | TYRMEN1KMT2AALOX5 | |
| SCHEMBL18321224 | 0.82 | EGFR (0.53) | TYRALOX5CES2 | |
| SCHEMBL4652324 | 0.80 | MEN1 (0.46) | TYRMEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-120136703-A | Compound, polymer, composition for film formation, pattern formation method, method for forming insulating film, and method for producing compound | 三菱瓦斯化学株式会社 | 2025-06-13 | — | — | CN | disclosed |
| CN-120136704-A | Compound, polymer, composition for film formation, pattern formation method, method for forming insulating film, and method for producing compound | 三菱瓦斯化学株式会社 | 2025-06-13 | — | — | CN | disclosed |
| CN-114245792-A | Compound, polymer, composition for film formation, method for pattern formation, method for forming insulating film, method for producing compound, and method for producing iodine-containing vinyl polymer and acetylated derivative thereof | 三菱瓦斯化学株式会社 | 2022-03-25 | — | — | CN | disclosed |