⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10264679 | 0.91 | CA1 (0.31) | — | |
| SCHEMBL2884916 | 0.83 | — | — | |
| SCHEMBL2742246 | 0.77 | SCN9A (0.34) | — | |
| SCHEMBL13160596 | 0.77 | DPP8 (0.32) | — | |
| SCHEMBL2742247 | 0.75 | — | — | |
| SCHEMBL17738143 | 0.75 | — | — | |
| SCHEMBL2742239 | 0.74 | — | — | |
| SCHEMBL3338141 | 0.74 | — | — | |
| SCHEMBL14632729 | 0.73 | CYP17A1 (0.30) | — | |
| SCHEMBL10264670 | 0.73 | CYP17A1 (0.30) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20120034559-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM THEREFROM AND METHOD OF FORMING PATTERN THEREWITH | FUJIFILM CORPORATION (JP) | 2012-02-09 | — | — | US | disclosed |
| US-20120003583-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2012-01-05 | — | — | US | disclosed |