SCHEMBL288371

SCHEMBL288371

C=CC(=O)OC(C)COP(=O)(O)O

nearest known ligand 0.44

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.44
PGK1 P00558 1/20 0.40
PGK2 P07205 1/20 0.40
PGD P52209 5/20 0.38
MPI P34949 1/20 0.38
LPAR3 Q9UBY5 5/20 0.34
LPAR1 Q92633 2/20 0.34
ENPP2 Q13822 1/20 0.34
SMN1; SMN2 Q16637 1/20 0.34
LPAR2 Q9HBW0 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL31055781 1.00 TSHR (0.44) TSHRPGK1PGK2PGDMPI
SCHEMBL27885526 0.98 TSHR (0.43) TSHRPGK1PGK2PGDMPI
SCHEMBL27040300 0.98 TSHR (0.43) TSHRPGK1PGK2PGDMPI
SCHEMBL27040272 0.98 TSHR (0.43) TSHRPGK1PGK2PGDMPI
SCHEMBL7878849 0.89 TSHR (0.44) TSHR
SCHEMBL715468 0.87 TSHR (0.46) TSHR
SCHEMBL6673980 0.87 BTN3A1 (0.40) TSHRLPAR3LPAR1
SCHEMBL27983078 0.85 TSHR (0.41) TSHR
SCHEMBL28829534 0.85 TSHR (0.33) TSHRPGK1PGK2
SCHEMBL21456888 0.84 TSHR (0.38) TSHRPGK1PGK2PGDMPI

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 650 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115772245-B High-robustness self-compacting concrete special-purpose phosphate water reducer and preparation method thereof 深中通道管理中心 2025-05-06 CN claimed
CN-118290922-A High-strength high-toughness PC/PBT alloy plastic and preparation method thereof 上海祺申塑业股份有限公司 2024-07-05 CN claimed
CN-118290080-A Cement concrete mortar containing inferior sand and preparation method thereof 华南理工大学 2024-07-05 CN claimed
CN-118222163-A UV mirror back coating for silver mirror and preparation method of silver mirror 中天恒泽科技(深圳)有限公司 2024-06-21 CN claimed
CN-118108946-A High-adhesion UV release film adhesion promoter, preparation method thereof and release film 太仓斯迪克新材料科技有限公司 2024-05-31 CN claimed
CN-117987049-A Halogen-free flame-retardant acrylate adhesive for flexible printed circuit board, preparation method thereof and adhesive film 华烁电子材料(武汉)有限公司 2024-05-07 CN claimed
CN-117903378-A Polycarboxylate superplasticizer containing phosphate groups, and preparation method and application thereof 广州地铁集团有限公司 2024-04-19 CN claimed
CN-116285400-B Porous carbon polymer/block copolymer modified asphalt, and preparation method and application thereof 山东金衢设计咨询集团有限公司 2024-04-02 CN claimed
CN-117736381-A High-compatibility water reducer suitable for carbon-trapped concrete and preparation method thereof 中国建筑材料科学研究总院有限公司 2024-03-22 CN claimed
CN-117623662-A Polycarboxylate water reducer composition 四川省晋川建材有限公司 2024-03-01 CN claimed
CN-111019062-A Quick-hardening early-strength polycarboxylate superplasticizer and preparation method thereof 重庆江通新型建材股份有限公司 2020-04-17 CN claimed
CN-110903790-A UV (ultraviolet) viscosity-reducing composition and UV viscosity-reducing adhesive tape with same 苏州高泰电子技术股份有限公司 2020-03-24 CN claimed
CN-110364735-A A kind of lithium ion battery silicon-carbon cathode adhesive, preparation and its application 中国乐凯集团有限公司 2019-10-22 CN claimed
CN-106444282-A Photosensitive resin composition containing oxime ester photoinitiator and application of photosensitive resin composition 常州强力先端电子材料有限公司 2017-02-22 CN claimed
CN-104614940-A Photosensitive resin composition and application thereof CHANGZHOU TRONLY ADVANCED ELECTRONIC MATERIALS CO LTD 2015-05-13 CN claimed
CN-103293855-A Acrylic ester photocuring composition CHANGZHOU TRONLY ADVANCED ELECTRONIC MATERIALS CO LTD 2013-09-11 CN claimed
CN-101035499-B Self-adhesive compositions including a plurality of acidic compounds 3M INNOVATIVE PROPERTIES CO 2012-09-05 CN claimed
EP-0778297-B1 Hydrophilic copolymer, process for producing same, photosensitive composition, and photosensitive rubber plate NIPPON ZEON CO (JP) 1999-07-14 EP claimed
US-5889116-A BLEND OF AN ELASTOMER, HYDROPHILIC COPOLYMER AND PHOTOINITIATORS NIPPON ZEON CO., LTD. (JP) 1999-03-30 US claimed
EP-0778297-A1 Hydrophilic copolymer, process for producing same, photosensitive composition, and photosensitive rubber plate NIPPON ZEON CO., LTD. (JP) 1997-06-11 EP claimed