⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8087748 | 0.79 | — | — | |
| SCHEMBL28672511 | 0.78 | — | — | |
| SCHEMBL15081221 | 0.76 | — | — | |
| SCHEMBL2412104 | 0.71 | — | — | |
| SCHEMBL2695678 | 0.71 | — | — | |
| SCHEMBL20679500 | 0.71 | — | — | |
| SCHEMBL8029608 | 0.69 | — | — | |
| SCHEMBL2070403 | 0.69 | — | — | |
| SCHEMBL1991255 | 0.69 | — | — | |
| SCHEMBL333136 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10359700-B2 | Salt, acid generator, photoresist composition and process of producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2019-07-23 | — | — | US | disclosed |
| US-20150338735-A1 | SALT, ACID GENERATOR, PHOTORESIST COMPOSITION AND PROCESS OF PRODUCING PHOTORESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2015-11-26 | — | — | US | disclosed |
| US-9176379-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2015-11-03 | — | — | US | disclosed |
| EP-1812149-B1 | SEMIPERMEABLE COMPOSITE MEMBRANE, PRODUCTION PROCESS THEREOF AND TREATMENT METHOD FOR BORON-CONTAINING WATER | TORAY INDUSTRIES (JP) | 2013-06-12 | — | — | EP | disclosed |
| US-20120264059-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-10-18 | — | — | US | disclosed |
| US-7641054-B2 | Composite semipermeable membrane, production process thereof, and element, fluid separation equipment and treatment method for boron-containing water using the same | TORAY INDUSTRIES, INC. (JP) | 2010-01-05 | — | — | US | disclosed |
| US-20080000843-A1 | Composite Semipermeable Membrane, Production Process Thereof, and Element, Fluid Separation Equipment and Treatment Method for Boron-Containing Water Using the Same | TORAY INDUSTRIES, INC. (JP) | 2008-01-03 | — | — | US | disclosed |
| EP-1812149-A1 | COMPOSITE SEMIPERMEABLE MEMBRANE, PRODUCTION PROCESS THEREOF, AND ELEMENT, FLUID SEPARATION EQUIPMENT AND TREATMENT METHOD FOR BORON-CONTAINING WATER USING THE SAME | TORAY INDUSTRIES, INC. (JP) | 2007-08-01 | — | — | EP | disclosed |
| WO-2006051888-A1 | COMPOSITE SEMIPERMEABLE MEMBRANE, PRODUCTION PROCESS THEREOF, AND ELEMENT, FLUID SEPARATION EQUIPMENT AND TREATMENT METHOD FOR BORON-CONTAINING WATER USING THE SAME | TORAY INDUSTRIES, INC. (JP) | 2006-05-18 | — | — | WO | disclosed |