⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5868545 | 0.85 | SLC6A4 (0.35) | — | |
| SCHEMBL922299 | 0.82 | ESR2 (0.35) | — | |
| SCHEMBL17620649 | 0.82 | — | — | |
| SCHEMBL13069780 | 0.82 | — | — | |
| SCHEMBL932218 | 0.79 | — | — | |
| SCHEMBL131715 | 0.77 | — | — | |
| SCHEMBL69189 | 0.77 | — | — | |
| Ethane SCHEMBL23783521 | 0.73 | — | — | |
| SCHEMBL3898434 | 0.73 | — | — | |
| SCHEMBL3901158 | 0.73 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3555161-B1 | AN AQUEOUS DISPERSION OF POLYURETHANE | COVESTRO DEUTSCHLAND AG (DE) | 2025-08-20 | — | — | EP | disclosed |
| US-11685805-B2 | Aqueous dispersion of polyurethane | COVESTRO DEUTSCHLAND AG (DE) | 2023-06-27 | — | — | US | disclosed |
| CN-112513122-B | Coating composition | 科思创知识产权两合公司 | 2022-11-15 | — | — | CN | disclosed |
| CN-110607120-B | Coating composition | 科思创德国股份有限公司 | 2022-07-15 | — | — | CN | disclosed |
| US-11168231-B2 | Coating composition | COVESTRO INTELLECTUAL PROPERTY GMBH & CO. KG (DE) | 2021-11-09 | — | — | US | disclosed |
| CN-109134804-B | Aqueous polyurethane dispersion | 科思创德国股份有限公司 | 2021-10-22 | — | — | CN | disclosed |
| US-20210230448-A1 | COATING COMPOSITION | COVESTRO DEUTSCHLAND AG (DE) | 2021-07-29 | — | — | US | disclosed |
| US-20210130532-A1 | AN AQUEOUS DISPERSION OF POLYURETHANE | COVESTRO DEUTSCHLAND AG (DE) | 2021-05-06 | — | — | US | disclosed |
| EP-3807335-A1 | COATING COMPOSITION | Covestro Intellectual Property GmbH & Co. KG (DE) | 2021-04-21 | — | — | EP | disclosed |
| CN-112513122-A | Coating composition | 科思创知识产权两合公司 | 2021-03-16 | — | — | CN | disclosed |
| EP-1951802-B1 | IONIZING RADIATION STABLE THERMOPLASTIC COMPOSITION, METHOD OF MAKING, AND ARTICLES FORMED THEREFROM | SABIC INNOVATIVE PLASTICS IP (NL) | 2010-07-28 | — | — | EP | disclosed |
| US-7649039-B2 | Blend of an uncappped polycarbonate and an arylcarboxylate-endcapped homo-or copolycarbonate that is prepared by interfacial polymerization of diol, activated carbonyl compound and an arylcarbonyl halide; decreased discoloration after exposure to gamma radiation | SABIC INNOVATIVE PLASTICS IP B.V. (NL) | 2010-01-19 | — | — | US | disclosed |
| US-7501222-B2 | Photoresist monomer polymer thereof and photoresist composition including the same | DONGJIN SEMICHEM CO., LTD. (KR) | 2009-03-10 | — | — | US | disclosed |
| US-7501222-B2 | Photoresist monomer polymer thereof and photoresist composition including the same | DONGJIN SEMICHEM CO., LTD. (KR) | 2009-03-10 | — | — | US | disclosed |
| US-7501222-B2 | Photoresist monomer polymer thereof and photoresist composition including the same | DONGJIN SEMICHEM CO., LTD. (KR) | 2009-03-10 | — | — | US | disclosed |
| EP-1951802-A1 | IONIZING RADIATION STABLE THERMOPLASTIC COMPOSITION, METHOD OF MAKING, AND ARTICLES FORMED THEREFROM | General Electric Company (US) | 2008-08-06 | — | — | EP | disclosed |
| WO-2007053305-A1 | IONIZING RADIATION STABLE THERMOPLASTIC COMPOSITION, METHOD OF MAKING, AND ARTICLES FORMED THEREFROM | GENERAL ELECTRIC COMPANY (US) | 2007-05-10 | — | — | WO | disclosed |
| US-20070100021-A1 | Ionizing radiation stable thermoplastic composition, method of making, and articles formed therefrom | SHPP GLOBAL TECHNOLOGIES B.V. (NL) | 2007-05-03 | — | — | US | disclosed |
| US-20060292489-A1 | Photoresist monomer polymer thereof and photoresist composition including the same | DONGJIN SEMICHEM CO., LTD. | 2006-12-28 | — | — | US | disclosed |
| EP-1736828-A1 | Photoresist monomer, polymer thereof and photoresist composition including the same | DONGJIN SEMICHEM CO., LTD (KR) | 2006-12-27 | — | — | EP | disclosed |