SCHEMBL28875258

SCHEMBL28875258

CC(C)(C)c1c(S(=O)(=O)O)c(S(=O)(=O)O)c2ccccc2c1C(C)(C)C.[NaH]

nearest known ligand 0.34

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
CYP2D6 P10635 1/20 0.34
TTR P02766 1/20 0.33
TSHR P16473 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
KDM4E B2RXH2 1/20 0.33
POLB P06746 1/20 0.33
APEX1 P27695 1/20 0.33
TDP1 Q9NUW8 1/20 0.33
MYC P01106 1/20 0.32
MPL P40238 1/20 0.31
LDHA P00338 1/20 0.31
SUMO2 P61956 2/20 0.31
SUMO1 P63165 2/20 0.31
SENP7 Q9BQF6 2/20 0.31
SENP2 Q9HC62 2/20 0.31
SENP1 Q9P0U3 2/20 0.31
SENP3 Q9H4L4 1/20 0.31
PSD A5PKW4 1/20 0.31
HSD17B2 P37059 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29888654 0.98 CYP2D6 (0.35) CYP2D6TTRTSHRSMN1; SMN2KDM4E
SCHEMBL16553161 0.98 CYP2D6 (0.35) CYP2D6TTRTSHRSMN1; SMN2KDM4E
SCHEMBL28576715 0.93 CYP2D6 (0.34) CYP2D6TTRTSHRSMN1; SMN2KDM4E
SCHEMBL5272789 0.91 CYP2D6 (0.35) CYP2D6TTRTSHRSMN1; SMN2KDM4E
SCHEMBL7783772 0.91 CYP2D6 (0.35) CYP2D6TTRTSHRSMN1; SMN2KDM4E
SCHEMBL4878318 0.89 TSHR (0.38) CYP2D6TTRTSHRSMN1; SMN2KDM4E
SCHEMBL2524546 0.76 TSHR (0.48) CYP2D6TTRTSHRSMN1; SMN2KDM4E
SCHEMBL2842391 0.75 NR1I2 (0.39) TTRTSHRPOLBTDP1PSD
SCHEMBL29908011 0.75 NR1I2 (0.39) TTRTSHRPOLBTDP1PSD
Hydrochloric Acid SCHEMBL11755878 0.74 TSHR (0.46) CYP2D6TTRTSHRSMN1; SMN2KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-104395834-B The method for recycling of development treatment waste liquid method for concentration and development treatment waste liquid 富士胶片株式会社 2019-07-05 CN disclosed