⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL537875 | 0.95 | — | — | |
| SCHEMBL10585671 | 0.90 | — | — | |
| SCHEMBL11856418 | 0.90 | — | — | |
| SCHEMBL28548086 | 0.90 | — | — | |
| SCHEMBL294328 | 0.90 | — | — | |
| SCHEMBL2696110 | 0.90 | — | — | |
| SCHEMBL625535 | 0.90 | — | — | |
| SCHEMBL28632549 | 0.90 | — | — | |
| Ethylene SCHEMBL11267600 | 0.86 | — | — | |
| SCHEMBL2694175 | 0.86 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115386927-A | Method for plating rhodium and ruthenium on surface of copper material | 惠州市安泰普表面处理科技有限公司 | 2022-11-25 | — | — | CN | claimed |
| CN-115386927-A | Method for plating rhodium and ruthenium on surface of copper material | 惠州市安泰普表面处理科技有限公司 | 2022-11-25 | — | — | CN | disclosed |