Triethylene Glycol

Triethylene Glycol

SCHEMBL28899043

C=CC(=O)O.CO.OCCOCCOCCO

nearest known ligand 0.50

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Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 2/20 0.50
KMT2A Q03164 2/20 0.50
TSHR P16473 8/20 0.46
ALDH1A1 P00352 6/20 0.46
HSD17B10 Q99714 3/20 0.46
TP53 P04637 2/20 0.46
HIF1A Q16665 2/20 0.46
MAPK1 P28482 1/20 0.46
LMNA P02545 1/20 0.46
THRB P10828 2/20 0.40
HTT P42858 1/20 0.40
MAPT P10636 1/20 0.40
ALOX15 P16050 1/20 0.35
HPGD P15428 1/20 0.33
CYP3A4 P08684 1/20 0.32
BLM P54132 1/20 0.31
PMP22 Q01453 1/20 0.31
EPHX2 P34913 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Tetraethylene Glycol SCHEMBL224783 0.95 MEN1 (0.55) MEN1KMT2ATSHRALDH1A1HSD17B10
Acrylic Acid SCHEMBL1537383 0.95 MEN1 (0.55) MEN1KMT2ATSHRALDH1A1HSD17B10
Acrylic Acid SCHEMBL1537361 0.95 MEN1 (0.55) MEN1KMT2ATSHRALDH1A1HSD17B10
Acrylic Acid SCHEMBL10533442 0.95 MEN1 (0.55) MEN1KMT2ATSHRALDH1A1HSD17B10
Acrylic Acid SCHEMBL8850428 0.95 MEN1 (0.55) MEN1KMT2ATSHRALDH1A1HSD17B10
Acrylic Acid SCHEMBL1537474 0.95 MEN1 (0.55) MEN1KMT2ATSHRALDH1A1HSD17B10
Acrylic Acid SCHEMBL1537471 0.95 MEN1 (0.55) MEN1KMT2ATSHRALDH1A1HSD17B10
Acrylic Acid SCHEMBL8851193 0.95 MEN1 (0.55) MEN1KMT2ATSHRALDH1A1HSD17B10
Acrylic Acid SCHEMBL8852479 0.95 MEN1 (0.55) MEN1KMT2ATSHRALDH1A1HSD17B10
Triethylene Glycol SCHEMBL5171706 0.95 MEN1 (0.55) MEN1KMT2ATSHRALDH1A1HSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-107885034-B Negative white photosensitive resin composition and application thereof 奇美实业股份有限公司 2023-03-07 CN disclosed
CN-108693710-B Positive photosensitive polysiloxane composition 奇美实业股份有限公司 2022-12-02 CN disclosed