Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 4/20 | 0.48 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.47 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.44 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.44 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.44 |
| ▸ | TP53 | P04637 | 2/20 | 0.30 |
| ▸ | MAPT | P10636 | 2/20 | 0.30 |
| ▸ | HPGD | P15428 | 2/20 | 0.30 |
| ▸ | MEN1 | O00255 | 1/20 | 0.30 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.30 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.30 |
| ▸ | PPARG | P37231 | 1/20 | 0.30 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14832615 | 0.76 | TSHR (0.54) | TSHRSMN1; SMN2ALDH1A1TDP1MAPK1 | |
| SCHEMBL4298953 | 0.75 | TSHR (0.58) | TSHRSMN1; SMN2ALDH1A1TDP1MAPK1 | |
| Methoxymethane SCHEMBL28451992 | 0.74 | TSHR (0.68) | TSHRSMN1; SMN2ALDH1A1TDP1MAPK1 | |
| SCHEMBL7920440 | 0.73 | TSHR (0.50) | TSHRSMN1; SMN2ALDH1A1TDP1MAPK1 | |
| SCHEMBL23539641 | 0.72 | — | — | |
| SCHEMBL15716951 | 0.72 | TSHR (0.65) | TSHRSMN1; SMN2ALDH1A1TDP1MAPK1 | |
| SCHEMBL409592 | 0.72 | — | — | |
| SCHEMBL4925410 | 0.72 | TSHR (0.54) | TSHRSMN1; SMN2ALDH1A1TDP1MAPK1 | |
| SCHEMBL27381883 | 0.72 | TSHR (0.54) | TSHRSMN1; SMN2ALDH1A1TDP1MAPK1 | |
| SCHEMBL26606254 | 0.72 | TSHR (0.54) | TSHRSMN1; SMN2ALDH1A1TDP1MAPK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8344039-B2 | Three-dimensional pattern forming material | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2013-01-01 | — | — | US | disclosed |
| US-20100286300-A1 | THREE-DIMENSIONAL PATTERN FORMING MATERIAL | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2010-11-11 | — | — | US | disclosed |
| US-6921623-B2 | Active components and photosensitive resin composition containing the same | KRI, INC. (JP) | 2005-07-26 | — | — | US | disclosed |
| US-20030064320-A1 | Active components and photosensitive resin composition containing the same | KRI, INC. (JP) | 2003-04-03 | — | — | US | disclosed |
| EP-1265103-A1 | ACTIVE COMPONENTS AND PHOTOSENSITIVE RESIN COMPOSITIONS CONTAINING THE SAME | Kansai Research Institute, Inc. (JP) | 2002-12-11 | — | — | EP | disclosed |