SCHEMBL28968443

SCHEMBL28968443

C=CC(=O)C=Cc1ccc(N=[N+]=[N-])cc1

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ F3 P13726 3/20 0.42
▸ HSD11B1 P28845 2/20 0.42
▸ CYP2D6 P10635 2/20 0.42
▸ CYP2C9 P11712 2/20 0.42
▸ TYR P14679 1/20 0.42
▸ TP53 P04637 1/20 0.41
▸ CYP1A2 P05177 4/20 0.41
▸ GSK3B P49841 2/20 0.40
▸ BACE1 P56817 2/20 0.40
▸ TLR9 Q9NR96 1/20 0.40
▸ JUN P05412 2/20 0.39
▸ FOS P01100 1/20 0.39
▸ PLIN1 O60240 1/20 0.39
▸ ALDH1A1 P00352 1/20 0.39
▸ LMNA P02545 1/20 0.39
▸ MAPT P10636 1/20 0.39
▸ RECQL P46063 1/20 0.39
▸ PLIN5 Q00G26 1/20 0.39
▸ SMN1; SMN2 Q16637 1/20 0.39
▸ ABHD5 Q8WTS1 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13810584 0.90 F3 (0.52) F3HSD11B1CYP2D6CYP2C9TYR
SCHEMBL13882622 0.90 F3 (0.52) F3HSD11B1CYP2D6CYP2C9TYR
SCHEMBL27744285 0.81 HCAR2 (0.53) CYP2C9TYRTP53GSK3BBACE1
SCHEMBL26666666 0.81 HCAR2 (0.53) CYP2C9TYRTP53GSK3BBACE1
SCHEMBL28710947 0.80 TP53 (0.38) TYRTP53LMNACA1CA2
SCHEMBL28710945 0.80 TP53 (0.38) TYRTP53LMNACA1CA2
SCHEMBL15457782 0.80 GLA (0.52) F3HSD11B1CYP2D6CYP2C9TYR
SCHEMBL14780999 0.80 GLA (0.52) F3HSD11B1CYP2D6CYP2C9TYR
SCHEMBL17818208 0.79 STAT3 (0.43) F3HSD11B1CYP2D6CYP2C9TYR
SCHEMBL13810583 0.79 F3 (0.56) F3PLIN1LMNAMAPTRECQL

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115785455-B Polyphosphate film-forming resin and photoresist composition 广东粤港澳大湾区黄埔材料研究院 2023-10-10 — — CN claimed
CN-115785455-A Polyphosphate film-forming resin and photoresist composition 广东粤港澳大湾区黄埔材料研究院 2023-03-14 — — CN claimed
CN-115785455-B Polyphosphate film-forming resin and photoresist composition 广东粤港澳大湾区黄埔材料研究院 2023-10-10 — — CN disclosed
CN-115785455-A Polyphosphate film-forming resin and photoresist composition 广东粤港澳大湾区黄埔材料研究院 2023-03-14 — — CN disclosed
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