⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4206230 | 0.75 | — | — | |
| Lithium SCHEMBL9144835 | 0.72 | — | — | |
| SCHEMBL9143137 | 0.72 | — | — | |
| SCHEMBL640591 | 0.71 | — | — | |
| SCHEMBL8468528 | 0.65 | — | — | |
| SCHEMBL5087032 | 0.63 | — | — | |
| SCHEMBL760684 | 0.63 | — | — | |
| SCHEMBL4162333 | 0.61 | — | — | |
| SCHEMBL6678380 | 0.61 | — | — | |
| Hydrochloric Acid SCHEMBL6817684 | 0.61 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20100286423-A1 | NICKEL-CONTAINING FILM-FORMING MATERIAL AND PROCESS FOR PRODUCING NICKEL-CONTAINING FILM | SHOWA DENKO K.K. (JP) | 2010-11-11 | — | — | US | claimed |
| US-11332487-B2 | Cyclopentadienyl nickel complex compound | MURATA MANUFACTURING CO., LTD. (JP) | 2022-05-17 | — | — | US | disclosed |
| US-20200216482-A1 | CYCLOPENTADIENYL NICKEL COMPLEX COMPOUND | MURATA MANUFACTURING CO., LTD. (JP) | 2020-07-09 | — | — | US | disclosed |
| US-20100286423-A1 | NICKEL-CONTAINING FILM-FORMING MATERIAL AND PROCESS FOR PRODUCING NICKEL-CONTAINING FILM | SHOWA DENKO K.K. (JP) | 2010-11-11 | — | — | US | disclosed |