SCHEMBL28981007

SCHEMBL28981007

C=C(C)C(=O)Oc1ccc(/C=C/C(=O)Oc2ccc(OC)cc2)cc1

nearest known ligand 0.68

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 4/20 0.61
MEN1 O00255 2/20 0.61
MAPT P10636 1/20 0.61
F3 P13726 2/20 0.57
THRB P10828 1/20 0.55
ATM Q13315 1/20 0.55
GSK3B P49841 2/20 0.54
HDAC3 O15379 2/20 0.53
HDAC1 Q13547 2/20 0.53
HDAC2 Q92769 2/20 0.53
HDAC8 Q9BY41 2/20 0.53
HDAC6 Q9UBN7 2/20 0.53
LMNA P02545 1/20 0.50
TDP1 Q9NUW8 1/20 0.50
BACE1 P56817 1/20 0.50
MAOB P27338 1/20 0.49
HDAC4 P56524 1/20 0.49
HDAC7 Q8WUI4 1/20 0.49
HDAC10 Q969S8 1/20 0.49
HDAC11 Q96DB2 1/20 0.49

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14275354 1.00 KMT2A (0.61) KMT2AMEN1MAPTF3THRB
SCHEMBL28981008 1.00 KMT2A (0.61) KMT2AMEN1MAPTF3THRB
SCHEMBL17433324 0.94 KMT2A (0.56) KMT2AMEN1MAPTF3THRB
SCHEMBL7691349 0.90 MAPT (0.57) KMT2AMEN1MAPTF3THRB
SCHEMBL16978138 0.90 KMT2A (0.52) KMT2AMEN1MAPTF3THRB
SCHEMBL18931471 0.90 KMT2A (0.52) KMT2AMEN1MAPTF3THRB
SCHEMBL7691353 0.90 MAPT (0.57) KMT2AMEN1MAPTF3THRB
SCHEMBL14300981 0.88 CA12 (0.55) KMT2AMEN1MAPTF3
SCHEMBL18121572 0.87 KMT2A (0.76) KMT2AMEN1MAPTF3THRB
SCHEMBL10954163 0.87 F3 (0.73) KMT2AMEN1MAPTF3LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115916853-B Polymer, and photo-alignment film and retardation film using the same 大阪有机化学工业株式会社 2024-07-09 CN disclosed
CN-115916853-A Novel polymer, and photo-alignment film and retardation film using same 大阪有机化学工业株式会社 2023-04-04 CN disclosed