Naphthalene

Naphthalene

SCHEMBL29033944

O=C(Cl)c1ccccc1.c1ccc2ccccc2c1

nearest known ligand 0.50

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CES1 P23141 7/20 0.50
CES2 O00748 6/20 0.50
ALDH1A1 P00352 3/20 0.50
TSHR P16473 2/20 0.50
DAO P14920 1/20 0.50
NAPRT Q6XQN6 1/20 0.50
MAPK1 P28482 3/20 0.46
TRPA1 O75762 1/20 0.46
GSK3B P49841 1/20 0.46
HIF1A Q16665 1/20 0.46
TDP1 Q9NUW8 5/20 0.46
MAPT P10636 3/20 0.46
CYP3A4 P08684 2/20 0.46
CA2 P00918 2/20 0.46
CA4 P22748 2/20 0.46
HSD17B10 Q99714 2/20 0.46
L3MBTL1 Q9Y468 2/20 0.46
CA12 O43570 2/20 0.46
CA1 P00915 2/20 0.46
CA9 Q16790 2/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19185622 0.92 CES1 (0.58) CES1CES2ALDH1A1TSHRDAO
Benzoyl Chloride SCHEMBL8995857 0.92 CES1 (0.58) CES1CES2ALDH1A1TSHRDAO
Benzoyl Chloride SCHEMBL1331834 0.92
Benzoyl Chloride SCHEMBL14359354 0.92 CES1 (0.58) CES1CES2ALDH1A1TSHRDAO
Benzoyl Chloride SCHEMBL1241 0.92
Benzoyl Chloride SCHEMBL2579227 0.89 CES1 (0.55) CES1CES2ALDH1A1TSHRDAO
Benzoyl Chloride SCHEMBL1935505 0.89 CES1 (0.55) CES1CES2ALDH1A1TSHRDAO
Benzoyl Chloride SCHEMBL1773097 0.89 CES1 (0.55) CES1CES2ALDH1A1TSHRDAO
Benzoyl Chloride SCHEMBL10363896 0.89 CES1 (0.55) CES1CES2ALDH1A1TSHRDAO
Benzoyl Chloride SCHEMBL4973993 0.89 CES1 (0.55) CES1CES2ALDH1A1TSHRDAO

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116444460-A Oxime ester compound, photoinitiator containing oxime ester compound, photo-curing resin composition containing oxime ester compound and application of photo-curing resin composition 常州强力先端电子材料有限公司 2023-07-18 CN disclosed