SCHEMBL2905337

SCHEMBL2905337

C1CCCCCCCCCCCCCC1.C1CCCCCCCCCCCCCC1.C1CCCCCCCCCCCCCC1.C1CCCCCCCCCCCCCC1.C1CCCCCCCCCCCCCC1.C=COC.C=COC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Cyclohexane SCHEMBL9446384 1.00
SCHEMBL1468850 1.00
Cyclohexane SCHEMBL36894 1.00
SCHEMBL2904126 1.00
Cyclohexane SCHEMBL25380016 0.93
Cyclohexane SCHEMBL37158 0.93
SCHEMBL16775 0.87
SCHEMBL194072 0.87
Ethylene Glycol SCHEMBL4135001 0.84 TSHR (0.30)
SCHEMBL2196025 0.82

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023223923-A1 HYDROXYL GROUP-CONTAINING COMPOUND, CURABLE RESIN COMPOSITION, CURED PRODUCT, AND LAYERED PRODUCT DIC株式会社 2023-11-23 WO disclosed
WO-2023223924-A1 GLYCIDYL ETHER GROUP-CONTAINING COMPOUND, CURABLE RESIN COMPOSITION, CURED OBJECT, AND LAMINATE DIC株式会社 2023-11-23 WO disclosed
WO-2023223925-A1 PHENOLIC HYDROXY GROUP-CONTAINING COMPOUND, CURABLE RESIN COMPOSITION, CURED PRODUCT, AND LAMINATE DIC株式会社 2023-11-23 WO disclosed
WO-2023223927-A1 GLYCIDYL ETHER GROUP-CONTAINING COMPOUND, CURABLE RESIN COMPOSITION, CURED PRODUCT, AND LAMINATE DIC株式会社 2023-11-23 WO disclosed
WO-2023223926-A1 GLYCIDYL ETHER GROUP-CONTAINING COMPOUND, CURABLE RESIN COMPOSITION, CURED PRODUCT, AND LAMINATE DIC株式会社 2023-11-23 WO disclosed
US-20100160587-A1 THERMOSETTING RESIN COMPOSITION AND OPTICAL MEMBER USING CURED PRODUCT OF THE THERMOSETTING RESIN COMPOSITION HITACHI CHEMICAL COMPANY, LTD. (JP) 2010-06-24 US disclosed
EP-2141203-A1 THERMOSETTING RESIN COMPOSITION AND OPTICAL MEMBER USING CURED PRODUCT OF THE THERMOSETTING RESIN COMPOSITION Hitachi Chemical Company, Ltd. (JP) 2010-01-06 EP disclosed
US-7569654-B2 Epoxy resin composition, process for producing epoxy resin, novel epoxy resin, novel phenol resin DIC CORPORATION (JP) 2009-08-04 US disclosed
US-7456247-B2 Phenolic resin formed from a difunctional phenol and a divinyl ether DAINIPPON INK AND CHEMICALS, INC. (JP) 2008-11-25 US disclosed
US-7365147-B2 Epoxy resin composition, process for producing epoxy resin, novel epoxy resin, novel phenol resin DAINIPPON INK AND CHEMICALS, INC. (JP) 2008-04-29 US disclosed
US-20060247392-A1 Epoxy resin composition, process for producing epoxy resin, novel epoxy resin, novel phenol resin DAINIPPON INK AND CHEMICALS, INC. (JP) 2006-11-02 US disclosed
US-20060241274-A1 Epoxy resin composition, process for producing epoxy resin, novel epoxy resin, novel phenol resin DAINIPPON INK AND CHEMICALS, INC. (JP) 2006-10-26 US disclosed
US-20060235183-A1 Epoxy resin composition, process for producing epoxy resin, novel epoxy resin, novel phenol resin DAINIPPON INK AND CHEMICALS, INC. (JP) 2006-10-19 US disclosed
US-7087702-B2 Epoxy resin composition, process for producing epoxy resin, novel epoxy resin, novel phenol resin DAINIPPON INK AND CHEMICALS, INC. (JP) 2006-08-08 US disclosed
EP-1411101-B1 Epoxy resin composition and process for producing epoxy resins DAINIPPON INK & CHEMICALS (JP) 2006-04-19 EP disclosed
US-20040087740-A1 Epoxy resin composition, process for producing epoxy resin, novel epoxy resin, novel phenol resin DAINIPPON INK AND CHEMICALS, INC. (JP) 2004-05-06 US disclosed
EP-1411101-A1 Epoxy resin composition, process for producing epoxy resin, novel epoxy resin, novel phenol resin DAINIPPON INK AND CHEMICALS, INC. (JP) 2004-04-21 EP disclosed