SCHEMBL2906407

SCHEMBL2906407

C=CC[AsH2]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL11225335 0.95
Bromide SCHEMBL19031060 0.95
SCHEMBL15367421 0.67
SCHEMBL4882816 0.67
SCHEMBL9684310 0.60
SCHEMBL23732 0.59
SCHEMBL23546 0.59
SCHEMBL8852489 0.59 TSHR (0.54)
SCHEMBL1328 0.59
SCHEMBL23116592 0.56

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20100126961-A1 Polysilicon Planarization Solution for Planarizing Low Temperature Poly-Silicon Thin Film Panels AVANTOR PERFORMANCE MATERIALS, INC. 2010-05-27 US claimed
EP-2147462-A2 POLYSILICON PLANARIZATION SOLUTION FOR PLANARIZING LOW TEMPERATURE POLYSILICON THIN FILM PANELS MALLINCKRODT BAKER, Inc. (US) 2010-01-27 EP claimed
WO-2008133767-A2 POLYSILICON PLANARIZATION SOLUTION FOR PLANARIZING LOW TEMPERATURE POLYSILICON THIN FILM PANELS MALLINCKRODT BAKER, INC. (US) 2008-11-06 WO claimed
CN-101122026-A Polysilicon planarization solution for planarizing low temperature polysilicon film panel MALLINCKRODT BAKER INC (US) 2008-02-13 CN claimed
EP-0839817-A2 Method for purifying mono-alkyl-arsines or mono-alkyl-phosphines FURUKAWA CO., LTD. (JP) 1998-05-06 EP claimed
CN-114377667-A Liquid hydrocarbon adsorption dearsenifying catalyst and its preparation method 中国石油天然气股份有限公司 2022-04-22 CN disclosed
CN-114377668-A Adsorption dearsenification catalyst and preparation method thereof 中国石油天然气股份有限公司 2022-04-22 CN disclosed
CN-208649240-U A kind of dearsenification adsorbent equipment 昆山市精细化工研究所有限公司 2019-03-26 CN disclosed
US-20100126961-A1 Polysilicon Planarization Solution for Planarizing Low Temperature Poly-Silicon Thin Film Panels AVANTOR PERFORMANCE MATERIALS, INC. 2010-05-27 US disclosed
EP-2147462-A2 POLYSILICON PLANARIZATION SOLUTION FOR PLANARIZING LOW TEMPERATURE POLYSILICON THIN FILM PANELS MALLINCKRODT BAKER, Inc. (US) 2010-01-27 EP disclosed
WO-2008133767-A2 POLYSILICON PLANARIZATION SOLUTION FOR PLANARIZING LOW TEMPERATURE POLYSILICON THIN FILM PANELS MALLINCKRODT BAKER, INC. (US) 2008-11-06 WO disclosed
CN-101122026-A Polysilicon planarization solution for planarizing low temperature polysilicon film panel MALLINCKRODT BAKER INC (US) 2008-02-13 CN disclosed
EP-0839817-A3 Method for purifying mono-alkyl-arsines or mono-alkyl-phosphines FURUKAWA CO., LTD. (JP) 1998-11-18 EP disclosed
EP-0839817-A3 Method for purifying mono-alkyl-arsines or mono-alkyl-phosphines FURUKAWA CO., LTD. (JP) 1998-11-18 EP disclosed
EP-0839817-A2 Method for purifying mono-alkyl-arsines or mono-alkyl-phosphines FURUKAWA CO., LTD. (JP) 1998-05-06 EP disclosed
EP-0839817-A2 Method for purifying mono-alkyl-arsines or mono-alkyl-phosphines FURUKAWA CO., LTD. (JP) 1998-05-06 EP disclosed
EP-0839817-A2 Method for purifying mono-alkyl-arsines or mono-alkyl-phosphines FURUKAWA CO., LTD. (JP) 1998-05-06 EP disclosed