SCHEMBL29080835

SCHEMBL29080835

CCC(=O)C(CC(Cc1ccccc1)(C(=O)c1ccc(N2CCOCC2)cc1)N(C)C)N1CCOCC1

nearest known ligand 0.41

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 3/20 0.41
ESR1 P03372 1/20 0.39
L3MBTL1 Q9Y468 2/20 0.38
HSD17B10 Q99714 1/20 0.38
MAPT P10636 3/20 0.37
MEN1 O00255 1/20 0.37
KMT2A Q03164 1/20 0.37
MAOB P27338 1/20 0.37
ALDH1A1 P00352 2/20 0.37
RORC P51449 2/20 0.37
POLB P06746 1/20 0.36
MAPK1 P28482 1/20 0.36
LMNA P02545 1/20 0.36
GSK3B P49841 1/20 0.36
AOC3 Q16853 2/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8898916 0.85 SMN1; SMN2 (0.51) SMN1; SMN2ESR1L3MBTL1MAPTMEN1
SCHEMBL35868 0.84 SMN1; SMN2 (0.48) SMN1; SMN2ESR1L3MBTL1MAPTMEN1
SCHEMBL28131034 0.84 SMN1; SMN2 (0.48) SMN1; SMN2ESR1L3MBTL1MAPTMEN1
SCHEMBL28990186 0.84 SMN1; SMN2 (0.48) SMN1; SMN2ESR1L3MBTL1MAPTMEN1
SCHEMBL3397043 0.84 SMN1; SMN2 (0.48) SMN1; SMN2ESR1L3MBTL1MAPTMEN1
Propane SCHEMBL27565501 0.83 SMN1; SMN2 (0.47) SMN1; SMN2ESR1L3MBTL1MAPTMEN1
SCHEMBL8900160 0.83 SMN1; SMN2 (0.43) SMN1; SMN2L3MBTL1MAPTMEN1KMT2A
Formaldehyde SCHEMBL28335498 0.82 SMN1; SMN2 (0.46) SMN1; SMN2ESR1L3MBTL1MAPTMEN1
SCHEMBL8900259 0.82 SMN1; SMN2 (0.46) SMN1; SMN2ESR1L3MBTL1MAPTMEN1
SCHEMBL20598742 0.81 AOC3 (0.46) SMN1; SMN2ESR1L3MBTL1MAPTMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109471330-B Photosensitive composition and photopolymerization initiator used therein 东京应化工业株式会社 2023-08-29 CN disclosed