⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3219257 | 0.67 | TSHR (0.44) | — | |
| SCHEMBL31229120 | 0.65 | TSHR (0.42) | — | |
| Potassium SCHEMBL31228960 | 0.65 | TSHR (0.42) | — | |
| SCHEMBL10934187 | 0.64 | — | — | |
| SCHEMBL239146 | 0.64 | — | — | |
| SCHEMBL576137 | 0.63 | — | — | |
| Lithium SCHEMBL30887897 | 0.62 | — | — | |
| SCHEMBL31620243 | 0.58 | ABCG2 (0.36) | — | |
| Cyclohexane SCHEMBL10738519 | 0.56 | TSHR (0.33) | — | |
| SCHEMBL31257821 | 0.55 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 43 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10453699-B2 | Etching method and etching apparatus | TOKYO ELECTRON LIMITED (JP) | 2019-10-22 | — | — | US | claimed |
| US-20150004795-A1 | PLASMA ETCHING METHOD AND PLASMA ETCHING APPARATUS | TOKYO ELECTRON LIMITED (JP) | 2015-01-01 | — | — | US | claimed |
| EP-2819151-A1 | Plasma etching method and plasma etching apparatus | TOKYO ELECTRON LIMITED (JP) | 2014-12-31 | — | — | EP | claimed |
| CN-116209542-A | Silicon oxide-based slurry for selective polishing of carbon-based films | CMC材料股份有限公司 | 2023-06-02 | — | — | CN | disclosed |
| US-20230058079-A1 | ETCHING METHOD, PLASMA PROCESSING APPARATUS, AND SUBSTRATE PROCESSING SYSTEM | TOKYO ELECTRON LIMITED (JP) | 2023-02-23 | — | — | US | disclosed |
| US-11476123-B2 | Etching method, plasma processing apparatus, and substrate processing system | TOKYO ELECTRON LIMITED (JP) | 2022-10-18 | — | — | US | disclosed |
| CN-110868861-B | Agricultural compositions | 萨卡帕·瓦达卡库塔 | 2022-03-15 | — | — | CN | disclosed |
| CN-113912525-A | Probe for modifying protein cysteine residue and preparation method thereof | 深圳湾实验室坪山生物医药研发转化中心 | 2022-01-11 | — | — | CN | disclosed |
| US-20210082713-A1 | ETCHING METHOD, PLASMA PROCESSING APPARATUS, AND SUBSTRATE PROCESSING SYSTEM | TOKYO ELECTRON LIMITED (JP) | 2021-03-18 | — | — | US | disclosed |
| US-10566089-B1 | Nanosensor array for medical diagnoses | UNITED STATES OF AMERICA AS REPRESENTED BY THE ADMINISTRATOR OF NASA (US) | 2020-02-18 | — | — | US | disclosed |
| US-10453699-B2 | Etching method and etching apparatus | TOKYO ELECTRON LIMITED (JP) | 2019-10-22 | — | — | US | disclosed |
| EP-0900252-B1 | POLYOLEFINE MATERIALS WITH IMPROVED ADHESIVITY | COGNIS DEUTSCHLAND GMBH (DE) | 2002-12-04 | — | — | EP | disclosed |
| EP-0900252-A1 | POLYOLEFINE MATERIALS WITH IMPROVED ADHESIVITY | Henkel Kommanditgesellschaft auf Aktien (DE) | 1999-03-10 | — | — | EP | disclosed |
| CN-1175570-A | Method and catalyst of synthesis of methyl glycolate | CHENGDU ORGANIC CHEM INST (CN) | 1998-03-11 | — | — | CN | disclosed |
| WO-1997044386-A1 | POLYOLEFINE MATERIALS WITH IMPROVED ADHESIVITY | HENKEL KOMMANDITGESELLSCHAFT AUF AKTIEN (DE) | 1997-11-27 | — | — | WO | disclosed |
| EP-0282814-A2 | Colour photographic recording material for the diffusion transfer process | Agfa-Gevaert AG (DE) | 1988-09-21 | — | — | EP | disclosed |
| EP-0049399-B1 | PROCESS FOR PRODUCING DISPERSIONS OF HYDROPHOBIC COLOUR COUPLERS IN WATER, AND USE OF THESE DISPERSIONS IN PRODUCING LIGHT-SENSITIVE REPRODUCTION MATERIALS | Agfa-Gevaert AG (DE) | 1986-09-10 | — | — | EP | disclosed |
| EP-0049399-A2 | Process for producing dispersions of hydrophobic colour couplers in water, and use of these dispersions in producing light-sensitive reproduction materials | Agfa-Gevaert AG (DE) | 1982-04-14 | — | — | EP | disclosed |
| EP-0005804-B1 | PHOTOGRAPHIC MATERIALS, PROCESS FOR THEIR PREPARATION AS WELL AS THE PRODUCTION OF PHOTOGRAPHIC IMAGES AND THIOETHERS | Agfa-Gevaert AG (DE) | 1980-11-26 | — | — | EP | disclosed |
| EP-0005804-A1 | Photographic materials, process for their preparation as well as the production of photographic images and thioethers | Agfa-Gevaert AG (DE) | 1979-12-12 | — | — | EP | disclosed |