⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27181871 | 1.00 | — | — | |
| SCHEMBL6446966 | 1.00 | — | — | |
| SCHEMBL21728035 | 0.80 | — | — | |
| SCHEMBL6310193 | 0.78 | — | — | |
| SCHEMBL1078082 | 0.72 | — | — | |
| SCHEMBL1078083 | 0.72 | — | — | |
| SCHEMBL727585 | 0.72 | — | — | |
| SCHEMBL726605 | 0.72 | — | — | |
| SCHEMBL13423857 | 0.72 | — | — | |
| SCHEMBL6446962 | 0.70 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-116762158-A | Method for forming pattern of metal oxide and method for manufacturing semiconductor element | 株式会社力森诺科 | 2023-09-15 | — | — | CN | disclosed |
| WO-2022163182-A1 | METHOD FOR FORMING PATTERN OF METAL OXIDE AND METHOD FOR PRODUCING SEMICONDUCTOR ELEMENT | 昭和電工株式会社 | 2022-08-04 | — | — | WO | disclosed |