⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL20632595 | 0.76 | — | — | |
| SCHEMBL28699117 | 0.73 | — | — | |
| SCHEMBL18484245 | 0.71 | — | — | |
| Hydrochloric Acid SCHEMBL28746679 | 0.71 | — | — | |
| SCHEMBL276455 | 0.69 | PIK3CD (0.35) | — | |
| SCHEMBL178547 | 0.67 | — | — | |
| SCHEMBL24435581 | 0.65 | — | — | |
| SCHEMBL7965445 | 0.65 | — | — | |
| SCHEMBL458834 | 0.64 | — | — | |
| SCHEMBL22388730 | 0.64 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12312569-B2 | Kit for cleaning agent and method for preparing cleaning agent | FUJIFILM CORPORATION (JP) | 2025-05-27 | — | — | US | disclosed |
| US-20210395645-A1 | CLEANING LIQUID | FUJIFILM ELECTRONIC MATERIALS CO., LTD. (JP) | 2021-12-23 | — | — | US | disclosed |
| US-20210317391-A1 | KIT FOR CLEANING AGENT AND METHOD FOR PREPARING CLEANING AGENT | FUJIFILM ELECTRONIC MATERIALS CO., LTD. (JP) | 2021-10-14 | — | — | US | disclosed |
| WO-2020137359-A1 | KIT FOR CLEANING AGENT AND METHOD FOR PREPARING CLEANING AGENT | 富士フイルムエレクトロニクスマテリアルズ株式会社 | 2020-07-02 | — | — | WO | disclosed |
| US-9862914-B2 | Cleaning agent for semiconductor substrates and method for processing semiconductor substrate surface | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2018-01-09 | — | — | US | disclosed |
| EP-3051577-B1 | CLEANING AGENT FOR SEMICONDUCTOR SUBSTRATES AND METHOD FOR PROCESSING SEMICONDUCTOR SUBSTRATE SURFACE | WAKO PURE CHEM IND LTD (JP) | 2017-10-18 | — | — | EP | disclosed |
| US-20160272924-A1 | CLEANING AGENT FOR SEMICONDUCTOR SUBSTRATES AND METHOD FOR PROCESSING SEMICONDUCTOR SUBSTRATE SURFACE | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2016-09-22 | — | — | US | disclosed |
| EP-3051577-A1 | CLEANING AGENT FOR SEMICONDUCTOR SUBSTRATES AND METHOD FOR PROCESSING SEMICONDUCTOR SUBSTRATE SURFACE | Wako Pure Chemical Industries, Ltd. (JP) | 2016-08-03 | — | — | EP | disclosed |
| US-20160060584-A1 | CLEANING AGENT FOR METAL WIRING SUBSTRATE, AND METHOD FOR CLEANING SEMICONDUCTOR SUBSTRATE | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2016-03-03 | — | — | US | disclosed |
| EP-2985783-A1 | CLEANING AGENT FOR METAL WIRING SUBSTRATE, AND METHOD FOR CLEANING SEMICONDUCTOR SUBSTRATE | Wako Pure Chemical Industries, Ltd. (JP) | 2016-02-17 | — | — | EP | disclosed |
| EP-2647693-A1 | SUBSTRATE CLEANER FOR COPPER WIRING, AND METHOD FOR CLEANING COPPER WIRING SEMICONDUCTOR SUBSTRATE | Wako Pure Chemical Industries, Ltd. (JP) | 2013-10-09 | — | — | EP | disclosed |
| US-20130261040-A1 | SUBSTRATE CLEANER FOR COPPER WIRING, AND METHOD FOR CLEANING COPPER WIRING SEMICONDUCTOR SUBSTRATE | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2013-10-03 | — | — | US | disclosed |
| EP-2231623-B1 | 5-PHENYL-1H-BENZO[E][1, 4]DIAZEPINE COMPOUNDS SUBSTITUTED WITH AN HYDROXAMIC ACID GROUP AS HISTONE DEACETYLASE INHIBITORS | UNIV FIRENZE (IT) | 2013-05-22 | — | — | EP | disclosed |
| US-8324202-B2 | 5-phenyl-1H-benzo [E] [1,4] diazepine compounds substituted with an hydroxamic acid group as histone deacetylase inhibitors | UNIVERSITA DEGLI STUDI DI FIRENZE (IT) | 2012-12-04 | — | — | US | disclosed |
| US-20100331316-A1 | 5-PHENYL-LH-BENZ0 [E] [1,4] DIAZEPINE COMPOUNDS SUBSTITUTED WITH AN HYDROXAMIC ACID GROUP AS HISTONE DEACETYLASE INHIBITORS | A.I.L. FIRENZE SEZIONE AUTONOMA DI FIRENZE DELL'ASSOCIAZIONE ITALIANA CONTRO LE LEUCEMIE, LINFOMI E MIELOMA - ONLUS (IT) | 2010-12-30 | — | — | US | disclosed |
| EP-2231623-A1 | 5-PHENYL-LH-BENZ0 [E] [1, 4] DIAZEPINE COMPOUNDS SUBSTITUTED WITH AN HYDROXAMIC ACID GROUP AS HISTONE DEACETYLASE INHIBITORS | Universita' Degli Studi di Firenze (IT) | 2010-09-29 | — | — | EP | disclosed |
| WO-2009081349-A1 | 5-PHENYL-LH-BENZ0 [E] [1, 4] DIAZEPINE COMPOUNDS SUBSTITUTED WITH AN HYDROXAMIC ACID GROUP AS HISTONE DEACETYLASE INHIBITORS | UNIVERSITA' DEGLI STUDI DI FIRENZE (IT) | 2009-07-02 | — | — | WO | disclosed |
| CN-101078877-A | Colored photosensitive resin composition, color filter, image sensor, and camera system | SUMITOMO CHEMICAL CO (JP) | 2007-11-28 | — | — | CN | disclosed |
| CN-101078878-A | Colored photosensitive resin composition, color filter, image sensor, and camera system | SUMITOMO CHEMICAL CO (JP) | 2007-11-28 | — | — | CN | disclosed |