SCHEMBL2922380

SCHEMBL2922380

C=CCO[SiH](OCCCC)OCCCC

nearest known ligand 0.38

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
TSHR P16473 4/20 0.37
ALDH1A1 P00352 1/20 0.37
HPGD P15428 1/20 0.36
MEN1 O00255 1/20 0.32
POLB P06746 1/20 0.32
KMT2A Q03164 1/20 0.32
ADRB2 P07550 1/20 0.32
ADRB1 P08588 1/20 0.32
ADRB3 P13945 1/20 0.32
ATM Q13315 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22654232 0.94 TSHR (0.39) TSHRALDH1A1HPGDMEN1POLB
SCHEMBL127583 0.92 TSHR (0.42) TSHRALDH1A1MEN1KMT2A
SCHEMBL127536 0.92 TSHR (0.42) TSHRALDH1A1MEN1KMT2A
SCHEMBL126203 0.92 TSHR (0.42) TSHRALDH1A1MEN1KMT2A
SCHEMBL8434318 0.86 MEN1 (0.34) TSHRMEN1POLBKMT2A
SCHEMBL27866289 0.84 TSHR (0.39) TSHRALDH1A1HPGDADRB2ADRB1
SCHEMBL2923641 0.84 TSHR (0.44) TSHR
SCHEMBL2923648 0.84 TSHR (0.44) TSHR
SCHEMBL27849324 0.83 TSHR (0.37) TSHRALDH1A1HPGDADRB2ADRB1
SCHEMBL27866317 0.83 TSHR (0.39) TSHRALDH1A1HPGDADRB2ADRB1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 56 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12492272-B2 Modified vinyl alcohol polymer, aqueous solution, and method for producing modified vinyl alcohol polymer KURARAY CO., LTD. (JP) 2025-12-09 US disclosed
CN-114450329-B Film for producing optical film, method for producing optical film, and optical film 株式会社可乐丽 2024-11-01 CN disclosed
US-20240309141-A1 MODIFIED VINYL ALCOHOL POLYMER, MODIFIED VINYL ALCOHOL POLYMER PRODUCTION METHOD, PARTICLES, AQUEOUS SOLUTION, COATING LIQUID, COATED ARTICLE, MOLDED PRODUCT, RELEASE PAPER, DISPERSANT, VINYL POLYMER PRODUCTION METHOD, AND MIXTURE KURARAY CO., LTD. (JP) 2024-09-19 US disclosed
US-20240218973-A1 POLYMER ALLOY, HOSE FOR HIGH-PRESSURE GAS, AND STORAGE CONTAINER FOR HIGH-PRESSURE GAS AGC Inc. (JP) 2024-07-04 US disclosed
EP-4378998-A1 POLYMER ALLOY, HOSE FOR HIGH-PRESSURE GAS, AND STORAGE CONTAINER FOR HIGH-PRESSURE GAS AGC INC. (JP) 2024-06-05 EP disclosed
CN-117715975-A Polymer alloy, hose for high-pressure gas, and storage container for high-pressure gas AGC株式会社 2024-03-15 CN disclosed
EP-3392304-B1 RESIN COMPOSITION AND METHOD FOR PRODUCING SAME MITSUBISHI CHEM CORP (JP) 2024-03-06 EP disclosed
EP-3778230-B1 GEOMEMBRANE, LANDFILL SHEET USING SAME, AND RADON BARRIER FILM KURARAY CO (JP) 2023-08-23 EP disclosed
CN-116635503-A Modified vinyl alcohol polymer, method for producing modified vinyl alcohol polymer, particles, aqueous solution, coating liquid, coating material, molded article, release paper, dispersant, method for producing vinyl polymer, and mixture 株式会社可乐丽 2023-08-22 CN disclosed
US-20230242688-A1 MODIFIED VINYL ALCOHOL POLYMER, AQUEOUS SOLUTION, AND METHOD FOR PRODUCING MODIFIED VINYL ALCOHOL POLYMER KURARAY CO., LTD. (JP) 2023-08-03 US disclosed
US-20050008497-A1 Droplet discharging head and microarray manufacturing method SEIKO EPSON CORPORATION (JP) 2005-01-13 US disclosed
US-20040054069-A1 Polyvinyl alcohol and method for producing polyvinyl alcohol KURARY CO., LTD. (JP) 2004-03-18 US disclosed
US-20040009357-A1 Vinyl alcohol polymer and process for producing vinyl alcohol polymer KURARY CO., LTD. (JP) 2004-01-15 US disclosed
EP-1380600-A1 Polyvinyl alcohol and method for producing polyvinyl alcohol KURARAY CO., LTD. (JP) 2004-01-14 EP disclosed
EP-1380599-A1 Polyvinyl alcohol and method for producing polyvinyl alcohol KURARAY CO., LTD. (JP) 2004-01-14 EP disclosed
US-4883344-A MULTILAYER FERROELECTRIC ELEMENT/STABILITY CANON KABUSHIKI KAISHA (JP) 1989-11-28 US disclosed
US-4820026-A UNIFORMITY, STABILITY, LARGE TILT ANGLE; INCLUDING UNSATURATED SILICON MONOMER CANON KABUSHIKI KAISHA (JP) 1989-04-11 US disclosed
EP-0146138-B1 MELT MOLDING MATERIAL KURARAY CO., LTD. (JP) 1988-12-28 EP disclosed
US-4576988-A PACKAGING KURARAY CO., LTD. (JP) 1986-03-18 US disclosed
EP-0146138-A2 Melt molding material KURARAY CO., LTD. (JP) 1985-06-26 EP disclosed