Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 2/20 | 0.50 |
| ▸ | ACHE | P22303 | 2/20 | 0.50 |
| ▸ | MAPT | P10636 | 3/20 | 0.46 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.46 |
| ▸ | GAA | P10253 | 2/20 | 0.46 |
| ▸ | TP53 | P04637 | 1/20 | 0.46 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.46 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.46 |
| ▸ | CHEK1 | O14757 | 1/20 | 0.44 |
| ▸ | NEK2 | P51955 | 1/20 | 0.44 |
| ▸ | LIMK1 | P53667 | 1/20 | 0.44 |
| ▸ | DYRK1A | Q13627 | 1/20 | 0.44 |
| ▸ | CLK4 | Q9HAZ1 | 1/20 | 0.44 |
| ▸ | SIGMAR1 | Q99720 | 1/20 | 0.44 |
| ▸ | LMNA | P02545 | 3/20 | 0.40 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.40 |
| ▸ | HTR6 | P50406 | 1/20 | 0.40 |
| ▸ | NSD2 | O96028 | 1/20 | 0.40 |
| ▸ | EGFR | P00533 | 1/20 | 0.40 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29435133 | 1.00 | TSHR (0.50) | TSHRACHEMAPTALDH1A1GAA | |
| Bromide SCHEMBL27593416 | 0.97 | TSHR (0.47) | TSHRACHEMAPTALDH1A1GAA | |
| Fluoride SCHEMBL27770917 | 0.97 | TSHR (0.47) | TSHRACHEMAPTALDH1A1GAA | |
| Water SCHEMBL27875928 | 0.97 | TSHR (0.47) | TSHRACHEMAPTALDH1A1GAA | |
| Lithium Ion SCHEMBL19732623 | 0.97 | TSHR (0.47) | TSHRACHEMAPTALDH1A1GAA | |
| Bromide SCHEMBL11815049 | 0.97 | TSHR (0.47) | TSHRACHEMAPTALDH1A1GAA | |
| Hydrochloric Acid SCHEMBL6421167 | 0.97 | TSHR (0.47) | TSHRACHEMAPTALDH1A1GAA | |
| Hydrochloric Acid SCHEMBL2869837 | 0.97 | TSHR (0.47) | TSHRACHEMAPTALDH1A1GAA | |
| SCHEMBL21065735 | 0.97 | TSHR (0.47) | TSHRACHEMAPTALDH1A1GAA | |
| SCHEMBL27755669 | 0.95 | TSHR (0.45) | TSHRACHEMAPTALDH1A1GAA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 6852 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-122037314-A | Preparation method and application of mesoporous silica/ammonium polyphosphate flame-retardant particles with core-shell structure | 北京理工大学 | 2026-05-15 | — | — | CN | claimed |
| EP-4714927-A1 | A REACTIVE RESIN COMPOSITION COMPRISING A PEROXIDE-FREE INITIATOR SYSTEM WITH A SULFINATE AND A TERTIARY AMINE | Hilti Aktiengesellschaft (LI) | 2026-03-25 | — | — | EP | claimed |
| EP-4714926-A1 | A REACTIVE RESIN COMPOSITION COMPRISING A PEROXIDE-FREE INITIATOR SYSTEM WITH A TERTIARY AMINE | Hilti Aktiengesellschaft (LI) | 2026-03-25 | — | — | EP | claimed |
| US-20250362261-A1 | REVERSIBLE FUNCTIONALIZATION OF NANOPORES USING AN ADHESION LAYER | UNIV OF RHODE ISLAND BOARD OF TRUSTEES (US) | 2025-11-27 | — | — | US | claimed |
| EP-4607278-A1 | CHEMICALLY-AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR PATTERN PROFILE IMPROVEMENT AND ETCH RESISTANCE ENHANCEMENT | Ycchem Co., Ltd. (KR) | 2025-08-27 | — | — | EP | claimed |
| EP-4581069-A1 | ANAEROBICALLY CURABLE COMPOSITIONS | Henkel AG & Co. KGaA (DE) | 2025-07-09 | — | — | EP | claimed |
| US-20250199405-A1 | CHEMICALLY-AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR PATTERN PROFILE IMPROVEMENT AND ETCH RESISTANCE ENHANCEMENT | YCCHEM CO., LTD. (KR) | 2025-06-19 | — | — | US | claimed |
| US-20250197690-A1 | ANAEROBICALLY CURABLE COMPOSITIONS | HENKEL AG & CO KGAA (DE) | 2025-06-19 | — | — | US | claimed |
| WO-2025107284-A1 | (METH) ACRYLATE-BASED ADHESIVE COMPOSITION FOR TWO-STEP ADHESIVE SYSTEMS | HENKEL AG & CO. KGAA (DE) | 2025-05-30 | — | — | WO | claimed |
| CN-119998727-A | Chemically amplified positive resist composition for improving pattern profile and enhancing etch resistance | YC化学制品株式会社 | 2025-05-13 | — | — | CN | claimed |
| US-4284547-A | AND AN UNSATURATED COMPOUND, COBALT SALT PROMOTER, AMINE ACCELERATOR AND A LITHIUM SALT EMULSIFIER | REICHHOLD CHEMICALS, INC., A CORP. OF DE | 1981-08-18 | — | — | US | claimed |
| US-4192820-A | Preparation of 3-methyl-2-buten-1-al | BASF AKTIENGESELLSCHAFT (DE) | 1980-03-11 | — | — | US | claimed |
| US-4083890-A | Unsaturated ester resin/monomer blend with hydroperoxide, vanadium compound and ketone peroxide for controlled gel time | THE DOW CHEMICAL COMPANY (US) | 1978-04-11 | — | — | US | claimed |
| US-4076537-A | Light-sensitive materials containing organo tellurium or selenium compounds and sensitizers | FUJI PHOTO FILM CO., LTD. (JA) | 1978-02-28 | — | — | US | claimed |
| US-3988507-A | Anaerobically hardening adhesives and sealants containing a hydrazone accelerator | HENKEL & CIE G.M.B.H. (DT) | 1976-10-26 | — | — | US | claimed |
| US-3987234-A | ACRYLIC ESTER POLYMERS | HENKEL & CIE G.M.B.H. (DT) | 1976-10-19 | — | — | US | claimed |
| US-3987019-A | ACRYLIC ESTER, PEROXIDE POLYMERIZATION CATALYST | HENKEL & CIE G.M.B.H. (DT) | 1976-10-19 | — | — | US | claimed |
| US-3985943-A | Anaerobically hardening adhesives and sealants containing organic disulfonamides | HENKEL & CIE G.M.B.H. (DT) | 1976-10-12 | — | — | US | claimed |
| US-3984385-A | ORGANIC SULFONIC ACID HYDRAZIDE | HENKEL & CIE G.M.B.H. (DT) | 1976-10-05 | — | — | US | claimed |
| US-3981835-A | SEALING CRACKS IN WELL BORES | WOODS RESEARCH AND DEVELOPMENT CORPORATION (US) | 1976-09-21 | — | — | US | claimed |